The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume comprehensively covers the state-of-the-art in ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic, and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
• Self-contained and comprehensive working knowledge of the full range of focused ion beam and two beam technology, including state-of-the-art developments in the field • Presents the principles, capabilities, challenges, advantages and applications of the technology and when best to implement it • Includes the possible ways in which the technology can fit into the future of nanotechnology and materials science by furthering the development of particular techniques
Contents
1. Two-beam focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Chris Kang, Clive Chandler and Matthew Weschler; 4. Imaging using electrons and ions Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Reyntjens and Lucille Giannuzzi; 6. Advances in real-time SEM imaging during focused ion beam milling: from 3D reconstruction to end point detection Edward Principe; 7. Fabrication of nanoscale structures using ions Ampere Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging Takeo Kamino, T. Yaguchi, T. Oshnishi and Tohru Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. 3D visualization of nanostructured materials Derren Dunn, Robert Hull and Alan J Kubis; 12. Ion implantation of surface layers Daniel Recht and Nan Yao; 13. Application in biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takasho Kaito.
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