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Focused Ion Beam Systems


  • Page extent: 408 pages
  • Size: 247 x 174 mm
  • Weight: 0.85 kg


 (ISBN-13: 9780521831994)

The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.

• Self-contained and comprehensive working knowledge of the full range of focused ion beam and two beam technology, including important developments in the field • Presents the principles, capabilities, challenges, advantages and applications of the technology and when best to implement it • Includes the possible ways in which the technology can fit into the future of nanotechnology and materials science by furthering the development of particular techniques


List of contributors; Preface; 1. Introduction to the focused ion beam system Nan Yao; 2. Interaction of ions with matter Nobutsugu Imanishi; 3. Gas assisted ion beam etching and deposition Hyoung Ho (Chris) Kang, Clive Chandler and Matthew Weschler; 4. Imagining using electrons and ion beams Kaoru Ohya and Tohru Ishitani; 5. Characterization methods using FIB/SEM DualBeam instrumentation Steve Rentjens and Lucille A. Giannuzzi; 6. High-density FIB-SEM 3D nanotomography: with applications of real-time imaging during FIB milling E. L. Principe; 7. Fabrication of nanoscale structures using ion beams Ampere A. Tseng; 8. Preparation for physico-chemical analysis Richard Langford; 9. In-situ sample manipulation and imaging T. Kamino, T. Yaguchi, T. Ohnishi and T. Ishitani; 10. Micro-machining and mask repair Mark Utlaut; 11. Three-dimensional visualization of nanostructured materials using focused ion beam tomography Derren Dunn, Alan J. Kubis and Robert Hull; 12. Ion beam implantation of surface layers Daniel Recht and Nan Yao; 13. Applications for biological materials Kirk Hou and Nan Yao; 14. Focused ion beam systems as a multifunctional tool for nanotechnology Toshiaki Fujii, Tatsuya Asahata and Takashi Kaito; Index.


Nan Yao, Nobutsugu Imanishi, Hyoung Ho (Chris) Kang, Clive Chandler, Matthew Weschler, Kaoru Ohya, Tohru Ishitani, Steve Reyntjens, Lucille A. Giannuzzi, E. L. Principe, Ampere A. Tseng, Richard Langford, T. Kamino, T. Yaguchi, T. Oshnishi, Mark Utlaut, Derren Dunn, Alan J. Kubis, Robert Hull, Daniel Recht, Kirk Hou, Toshiaki Fujii, Tatsuya Asahata, Takasho Kaito

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