Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-06-01T05:46:02.869Z Has data issue: false hasContentIssue false

Self-similar solutions for a free boundary problem in the doping of semiconductors

Published online by Cambridge University Press:  26 September 2008

L. A. Peletier
Affiliation:
Mathematical Institute, Leiden University, Leiden, The Netherlands
W. C. Troy
Affiliation:
Department of Mathematics, University of Pittsburgh, Pittsburgh, PA 15260, USA

Abstract

We study the development of concentration profiles in a semi-infinite slab of semi-conductor material, in which impurities have been implanted at a high concentration. When the implant is uniform throughout the slab, no impurities can pass through the face of the slab, and the vacancy concentration at the surface is kept at its equilibrium value, it is shown that the density profiles of impurities, vacancies and host atoms may have self-similar form. The analysis is constructive and yields qualitative properties of the profiles and the front.

Type
Research Article
Copyright
Copyright © Cambridge University Press 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[H]Hearne, M. T. 1988 Diffusion models for the doping of semiconductor crystals. PhD Thesis, Nottingham University, UK.Google Scholar
[K]King, J. R. 1990 Mathematical analysis of a model for substitutional diffusion. Proc. Roy. Soc. London A430, 377404.Google Scholar
[KMR]King, J. R., Meere, M. G. & Rogers, T. G. 1992 Asymptotic analysis of a non-linear model for substitutional diffusion in semiconductors. Z. angew. Math. Phys. 43, 505525.Google Scholar
[McL]McLeod, J. B. 1971 The existence of axially symmetric flow above a rotating disk. Proc. Roy. Soc. London A324, 391414.Google Scholar
[McLS]McLeod, J. B. & Serrin, J. 1968 The existence of similar solutions for some laminar boundary layer problems. Arch. Rational Mech. Anal. 31, 288303.CrossRefGoogle Scholar
[M]Meere, M. G. 1992 Nonlinear diffusion mechanisms in compound semiconductors. PhD Thesis, Nottingham University, UK.Google Scholar
[PT1]Peletier, L. A. & Troy, W. C. 1991 Self-similar solutions for infiltration of dopant into semiconductors. Arch. Rational Mech. Anal. 116, 7189.CrossRefGoogle Scholar
[PT2]Peletier, L. A. & Troy, W. C. 1994 Self-similar solutions for diffusion in semiconductors. Proc. Roy. Soc. Edinburgh 124A, 473506.Google Scholar
[ZT]Zahari, M. D. & Tuck, B. 1982 The effect of vacancy reduction on diffusion in semiconductors. J. Phys. D15, 17411750.Google Scholar