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Formation of loops on the surface of carbon nanofibers synthesized by plasma-enhanced chemical vapor deposition using an inductively coupled plasma reactor

Published online by Cambridge University Press:  03 March 2011

Shinn-Shyong Tzeng*
Affiliation:
Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Republic of China
Pei-Lun Wang
Affiliation:
Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Republic of China
Ting-Yu Wu
Affiliation:
Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Republic of China
Kao-Shao Chen
Affiliation:
Department of Materials Engineering, Tatung University, Taipei 104, Taiwan, Republic of China
San-Der Chyou
Affiliation:
Taiwan Power Research Institute, Taiwan Power Company, Taipei 238, Taiwan, Republic of China
Win-Tai Lee
Affiliation:
Taiwan Power Research Institute, Taiwan Power Company, Taipei 238, Taiwan, Republic of China
Chih-Shen Chen
Affiliation:
Taiwan Power Research Institute, Taiwan Power Company, Taipei 238, Taiwan, Republic of China
*
a) Address all correspondence to this author. e-mail: sstzeng@ttu.edu.tw
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Abstract

Carbon nanofibers (CNFs) were synthesized by both high-density plasma-enhanced chemical vapor deposition (CVD) and thermal CVD. The growth in the former was carried out in an inductively coupled plasma (ICP) reactor. The multilayer loop structure, which was reported to be found on both the inner and outer surfaces of cup-stacked-type CNFs grown using thermal CVD only after heat treatment above 1500 °C, was observed in the as-grown CNFs only on the outer surface using ICP-CVD. The dangling bonds caused by plasma etching and the bonding between edge carbon atoms aided by the high-density plasma are considered the main reasons of the formation of multilayer loops.

Type
Rapid Communications
Copyright
Copyright © Materials Research Society 2006

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