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Optical emission spectroscopic studies on the growth of YBCO thin films by dc-94.92 MHz hybrid plasma sputtering

Published online by Cambridge University Press:  03 March 2011

W. Ito ,
S. Mahajan ,
S. Okayama ,
Y. Yoshida  and
T. Morishita
W. Ito
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome 1 chome, Koto-ku, Tokyo 135, Japan
S. Mahajan
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome 1 chome, Koto-ku, Tokyo 135, Japan
S. Okayama
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome 1 chome, Koto-ku, Tokyo 135, Japan
Y. Yoshida
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome 1 chome, Koto-ku, Tokyo 135, Japan
T. Morishita
Affiliation:
Superconductivity Research Laboratory, ISTEC, 10-13 Shinonome 1 chome, Koto-ku, Tokyo 135, Japan
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Abstract

Optical emission spectroscopic studies of dc-94.92 MHz hybrid plasma generated in the newly developed magnetron sputtering system were performed during the growth of YBa2Cu3O7−δ (YBCO) thin films. All the detectable species showed uniform spatial distribution along the radial direction of the target more than 8 mm above the target surface. High cathode current conditions in the hybrid plasma were found to make the plasma with high ion density. The high ionizing efficiency was concluded to be essential in obtaining an excellent crystalline film. This result is explained by the ion acceleration mechanism through the ion sheath formed near the substrate surface. Oxygen gas introduced into the growing chamber during deposition was found to be responsible for the oxidation of the target surface.

Type
Articles
Information
Journal of Materials Research , Volume 9 , Issue 5 , May 1994 , pp. 1082 - 1088
Copyright
Copyright © Materials Research Society 1994

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References

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