Hostname: page-component-848d4c4894-hfldf Total loading time: 0 Render date: 2024-06-09T12:02:11.739Z Has data issue: false hasContentIssue false
  • English
  • Français

Pyrolytic properties of di-n-butyltin(IV) diacetate as a precursor for sprayed SnO2 thin films

Published online by Cambridge University Press:  03 March 2011

Isao Yagi ,
Eiichiro Ikeda  and
Yasuo Kuniya
Isao Yagi
Affiliation:
Research and Development Center, Kawai Musical Instruments Mfg. Co., Shinmiyakoda 1-4-3, Hamamatsu 431-21, Japan
Eiichiro Ikeda
Affiliation:
Department of Applied Chemistry, Faculty of Science and Engineering, Chuo University, Kasuga 1-13-27, Bunkyo-ku, Tokyo 112, Japan
Yasuo Kuniya
Affiliation:
Department of Applied Chemistry, Faculty of Science and Engineering, Chuo University, Kasuga 1-13-27, Bunkyo-ku, Tokyo 112, Japan
Get access

Abstract

The saturated vapor pressure and pyrolytic properties of di-n-butyltin(IV) diacetate have been investigated with and without oxygen in order to understand the orientational growth of SnO2 thin films by spray pyrolysis. The dependence of the saturated vapor pressure on temperature was determined: log P(evap.)Torr = −2.827 × 103/T + 7.687. It has been found that the pyrolysis of this compound consisted of two stages: elimination of the n-butyl groups in a temperature range between about 280°and 310 °C, and of the acetoxy groups above 320 °C. Such decompositions were shifted toward lower temperatures under oxygen. It was also found that oxygen in air in addition to intramolecular oxygen contributed to the formation of SnO2 crystal phase. Moreover, it was suggested that pyrolized chemical species preserving the Sn-O bond probably related the orientational growth of the (200) plane of sprayed SnO2 thin films.

Type
Articles
Information
Journal of Materials Research , Volume 9 , Issue 3 , March 1994 , pp. 663 - 668
Copyright
Copyright © Materials Research Society 1994

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Dawar, A. L. and Joshi, J. C., J. Mater. Sci. 19, 1 (1984).Google Scholar
2Kaito, C. and Saito, Y., J. Cryst. Growth 79, 403 (1986).Google Scholar
3Nagatomo, T., Maruta, Y., and Omoto, O., Thin Solid Films 192, 17 (1990).Google Scholar
4Godbole, V. P., Vispute, R. D., Chaudhari, S. M., Kanetkar, S. M., and Ogale, S. B., J. Mater. Res. 5, 372 (1990).CrossRefGoogle Scholar
5Suzuki, K. and Mizuhashi, M., Thin Solid Films 97, 89 (1982).CrossRefGoogle Scholar
6Minami, T., Nanto, H., and Takata, S., Jpn. J. Appl. Phys. 27, L287 (1988).Google Scholar
7Ippommatsu, M. and Sasaki, H., J. Electrochem. Soc. 136, 2123 (1989).CrossRefGoogle Scholar
8J-S. Ryu, Watanabe, Y., and Takata, M., J. Ceram. Soc. Jpn. 100, 1165 (1992).Google Scholar
9Murth, N. S. and Jawalekar, S. R., Thin Solid Films 100, 219 (1983).CrossRefGoogle Scholar
10Murth, N. S. and Jawalekar, S. R., Thin Solid Films 102, 283 (1983).Google Scholar
11Kim, K. H. and Chun, J. S., Thin Solid Films 141, 287 (1986).Google Scholar
12Kojima, M., Kato, H., and Imai, A., J. Appl. Phys. 64, 1902 (1988).CrossRefGoogle Scholar
13Borman, C. G. and Gordon, R. G., J. Electrochem. Soc. 136, 3820 (1989).Google Scholar
14Vlahovic, B. and Persin, M., J. Phys. D: Appl. Phys. 23, 1324 (1990).CrossRefGoogle Scholar
15Maruyama, T. and Tabata, K., J. Appl. Phys. 68, 4282 (1990).CrossRefGoogle Scholar
16Sanon, G., Pup, R., and Mansingh, A., Thin Solid Films 190, 287 (1990).CrossRefGoogle Scholar
17Tsunashima, A. and Matsushita, T., J. Mater. Sci. 21, 2731 (1986).CrossRefGoogle Scholar
18Takahashi, Y. and Wada, Y., J. Electrochem. Soc. 137, 267 (1990).CrossRefGoogle Scholar
19McAleer, J. F., Maigman, A., Moseley, P. T., and Williams, D. E., J. Chem. Soc, Faraday Trans. 85, 783 (1989).CrossRefGoogle Scholar
20Mooney, J. B. and Radding, S. B., Ann. Rev. Mater. Sci. 12, 81 (1982).Google Scholar
21Manifacier, J-C., Szepessy, L., Bresse, J. F., and Perotin, M., Mater. Res. Bull. XIV, 163 (1979).Google Scholar
22Maudes, J. S. and Rodriguez, T., Thin Solid Films 69, 183 (1980).Google Scholar
23Shanthi, E., Banerjee, A., Duta, V., and Chopra, K. L., J. Appl. Phys. 53, 1615 (1982).Google Scholar
24Kaneko, H. and Miyake, K., J. Appl. Phys. 53, 3629 (1982).CrossRefGoogle Scholar
25Agnihotri, O. P., Mohammad, M. T., Abass, A. K., and Arshak, K. I., Solid State Commun. 47, 195 (1983).CrossRefGoogle Scholar
26Siefert, S., Thin Solid Films 121, 275 (1984).CrossRefGoogle Scholar
27Islam, M. N. and Hakin, M. O., J. Phys. Chem. Solids 46, 339 (1985).Google Scholar
28Fantini, M., Torriani, I. L., and Constantino, C., J. Cryst. Growth 74, 439 (1986).CrossRefGoogle Scholar
29Fujimoto, M., Nishi, Y., Ito, A., Mishuku, T., Iida, H., and Shirasaki, S., Jpn. J. Appl. Phys. 27, 534 (1988).CrossRefGoogle Scholar
30Agashe, C., Marathe, B. R., Takwale, M. G., and Bhide, V. G., Thin Solid Films 164, 261 (1988).Google Scholar
31Haitjema, H., Elich, J. J., and Hoogendoorn, C. J., Sol. Energy Mater. 18, 282 (1989).CrossRefGoogle Scholar
32Popova, L. I., Michailov, M. G., Gueorguiev, V. K., and Shopov, A., Thin Solid Films 186, 107 (1990).CrossRefGoogle Scholar
33Bruneaux, J., Cachet, H., Froment, M., and Messad, A., Thin Solid Films 197, 129 (1991).CrossRefGoogle Scholar
34Borman, C. G. and Gordon, R. G., J. Electrochem. Soc. 136, 3820 (1989).CrossRefGoogle Scholar
35Kim, H. and Laitinen, H. A., J. Am. Ceram. Soc. 58, 23 (1975).Google Scholar
36Jackson, N. and Ford, J., Thin Solid Films 77, 23 (1981).CrossRefGoogle Scholar
37Haitjema, H. and Woerlee, G. F., Thin Solid Films 169, 1 (1989).CrossRefGoogle Scholar
38Yagi, I. and Kaneko, S., Chem. Lett., 2345 (1992).Google Scholar
39Yagi, I., Hagiwara, Y., Murakami, K., and Kaneko, S., J. Mater. Res. 8, 1481 (1993).Google Scholar
40Kuniya, Y. and Chino, T., Denki Kagaku 40, 857 (1972).Google Scholar
41Nitsche, R. and Richman, D., Z. Elektrochem. 66, 709 (1962).Google Scholar
42Silvestri, V. J. and Lyons, V., J. Electrochem. Soc. 109, 963 (1962).CrossRefGoogle Scholar
43Zuegel, M., J. Electrochem. Soc. 112, 1153 (1965).CrossRefGoogle Scholar
44Kirwan, D. J., J. Electrochem. Soc. 117, 1572 (1970).CrossRefGoogle Scholar
45Yagi, I., Fukushima, S., Imoto, F., and Kaneko, S., J. Surf. Sci. Soc. Jpn. 12, 316 (1991).Google Scholar
46Yagi, I., Kakizawa, K., Murakami, K., and Kaneko, S., unpublished.Google Scholar