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Latency Dose Formation In DMC By Inelastic Electron Scattering

Published online by Cambridge University Press:  22 July 2022

P. Specht*
Affiliation:
Department of MSE, University of California Berkeley, Berkeley, CA 94720, USA
C. Kisielowski
Affiliation:
TMF, Lawrence Berkeley National Laboratory, One Cyclotron Rd., Berkeley, CA 94720, USA
B. Freitag
Affiliation:
Thermo Fisher Scientific, Achtseweg Noord 5, 5651 GG Eindhoven, The Netherlands
E.R. Kieft
Affiliation:
Thermo Fisher Scientific, Achtseweg Noord 5, 5651 GG Eindhoven, The Netherlands
S. Rozeveld
Affiliation:
The Dow Chemical Company, Midland, MI 48667, USA
J. Kang
Affiliation:
The Dow Chemical Company, Midland, MI 48667, USA
A.J. Fielitz
Affiliation:
The Dow Chemical Company, Midland, MI 48667, USA
T.R. Fielitz
Affiliation:
The Dow Chemical Company, Midland, MI 48667, USA
D. van Dyck
Affiliation:
EMAT, University of Antwerp, 2020 Antwerp, Belgium
D.F. Yancey
Affiliation:
The Dow Chemical Company, Midland, MI 48667, USA
*
*Corresponding author: specht@berkeley.edu

Abstract

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Type
Electron Microscopy of Beam Sensitive Samples: The Trials and Tribulations of Electron-beam Sample Interactions
Copyright
Copyright © Microscopy Society of America 2022

References

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GaN research was supported by DTRA, contract #HDTRA1-17-1-0032. Work at the Molecular Foundry was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231Google Scholar