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A New Method to Characterize Non-oxide Thin Film Uniformity at Device Level using Electron Energy Loss Spectroscopy

Published online by Cambridge University Press:  23 September 2015

Zhi-Peng Li ,
Lifan Chen ,
Jianxin Fang ,
Haifeng Wang ,
Liang Hong ,
Xin Jiang  and
Yuankai Zheng
Zhi-Peng Li
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Lifan Chen
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Jianxin Fang
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Haifeng Wang
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Liang Hong
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Xin Jiang
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA
Yuankai Zheng
Affiliation:
Western Digital Corporation, Magnetic Heads Operations, 44100 Osgood Road, Fremont, California, USA

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 293 - 294
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1] Williams, D B & Carter, C B, "Transmission Electron Microscopy", 2nd Edition (Springer, New York) p. 744.Google Scholar
[2] Egerton, R F, "Electron Energy-Loss Spectroscopy in the Electron. Microscope", 2nd Edition (Plenum Press, New York and London) p. 238.Google Scholar