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Surface Sensitive and Compositional SEM Imaging for High Accelerating Voltages in Focused Ion/Electron Beam Systems

Published online by Cambridge University Press:  01 August 2010

T Agemura ,
T Nomaguchi  and
T Onishi
T Agemura
Affiliation:
Hitachi High-Technologies, Japan
T Nomaguchi
Affiliation:
Hitachi High-Technologies, Japan
T Onishi
Affiliation:
Hitachi High-Technologies, Japan

Extract

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Extended abstract of a paper presented at Microscopy and Microanalysis 2010 in Portland, Oregon, USA, August 1 – August 5, 2010.

Type
Abstract
Information
Microscopy and Microanalysis , Volume 16 , Supplement S2 , July 2010 , pp. 632 - 633
Copyright
Copyright © Microscopy Society of America 2010