Hostname: page-component-848d4c4894-75dct Total loading time: 0 Render date: 2024-06-01T13:33:40.832Z Has data issue: false hasContentIssue false
  • English
  • Français

Thermal Stability of Hf-based High-κ Dielectric Films on Si(100)

Published online by Cambridge University Press:  22 July 2003

M.J. Kim ,
J. Huang ,
D.K. Cha ,
M.A. Quevedo-Lopez ,
R.M. Wallace  and
B.E. Gnade
M.J. Kim
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
J. Huang
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
D.K. Cha
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
M.A. Quevedo-Lopez
Affiliation:
Silicon Technology Development, Texas Instruments, Inc., Dallas, Texas 7526
R.M. Wallace
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620
B.E. Gnade
Affiliation:
Department of Materials Science and Engineering, University of North Texas, Denton, TX 7620

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 9 , Issue S02 , August 2003 , pp. 506 - 507
Copyright
Copyright © Microscopy Society of America 2003