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Effect of a Channel Length and Drain Bias on the Threshold Voltage of Field Enhanced Solid Phase Crystallization Polycrystalline Thin Film Transistor on the Glass Substrate

Published online by Cambridge University Press:  01 February 2011

Won-Kyu Lee ,
Sang-Myeon Han ,
Sang-Geun Park ,
Young-Jin Chang ,
Kee-Chan Park ,
Chi-Woo Kim  and
Min-Koo Han
Won-Kyu Lee
Affiliation:
wklee@emlab.snu.ac.kr, Seoul National University, School of Electrical Engineering, Bldg. 130, Rm. 302, Seoul National Univ., San 56-1, Sillim-dong, Gwanak-gu, Seoul, 151-742, Korea, Republic of
Sang-Myeon Han
Affiliation:
smhan@emlab.snu.ac.kr, Seoul National University, School of Electrical Engineering, Bldg. 130, Rm. 302, Seoul National Univ., San 56-1, Sillim-dong, Gwanak-gu, Seoul, 151-742, Korea, Republic of
Sang-Geun Park
Affiliation:
psg97@emlab.snu.ac.kr, Seoul National University, School of Electrical Engineering, Bldg. 130, Rm. 302, Seoul National Univ., San 56-1, Sillim-dong, Gwanak-gu, Seoul, 151-742, Korea, Republic of
Young-Jin Chang
Affiliation:
yj.chang@samsung.com, Samsung Electronics Co., LCD Business, San-24, Nongseo-dong, Giheung-gu, Yongin, 449-711, Korea, Republic of
Kee-Chan Park
Affiliation:
keechan@konkuk.ac.kr, Konkuk University, Dept. of Electronics Engineering, Seoul, 143-701, Korea, Republic of
Chi-Woo Kim
Affiliation:
chiwookim@samsung.com, Samsung Electronics Co., LCD Business, San-24, Nongseo-dong, Giheung-gu, Yongin, 449-711, Korea, Republic of
Min-Koo Han
Affiliation:
mkh@snu.ac.kr, Seoul National University, School of Electrical Engineering, Bldg. 130, Rm. 302, Seoul National Univ., San 56-1, Sillim-dong, Gwanak-gu, Seoul, 151-742, Korea, Republic of
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Abstract

We have fabricated a new magnetic field enhanced solid phase crystallization (FESPC) polycrystalline silicon (poly-Si) thin film transistors (TFTs), which shows the excellent electrical characteristics and superior stability compared with hydrogenated amorphous silicon (a-Si:H) TFTs. The mobility (μ) and threshold voltage (VTH) of p-type TFTs of which the channel width and length are 5 μm and 7 μm, respectively are 31.98 cm2/Vs and -6.14 V, at VDS=-0.1 V. In the FESPC TFTs, the characteristics caused by grain boundary are remarkable due to large number of grain boundaries in the channel compared with poly-Si TFTs. The VTH of the TFT which have 5 μm channel length is smaller than that of 18 μm channel length by 1.36 V, which is considerably large value. It is due to the large number of grain boundaries in the channel and the high lateral electric field. The grain boundary potential barrier height is decreased, when the large lateral electric field is applied (which is called DIGBL effect). As a result of increased mobility, the drain current is increased, and VTH can be decreased. The activation energy (Ea) is strongly depended on the drain bias and the number of grain boundaries. is decreased, caused by the large drain bias and/or smaller number of grain boundaries. This decreased Ea can be reduced VTH due to increased the drain current. VTH of p-type poly-Si TFT employing FESPC on the glass substrate is affected by channel length and VDS due to energy barrier lowering effect at the grain boundary by increased lateral electrical field.

Keywords

displaypolycrystalSi
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 989: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology-2007 , 2007 , 0989-A17-05
Copyright
Copyright © Materials Research Society 2007

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