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Interface Morphology of RF-Sputtered NB/AL2O3 Multilayers Studied by X-Ray Reflectivity and Diffuse Scattering

Published online by Cambridge University Press:  21 February 2011

Tim Salditt ,
T. H. Metzger ,
J. Peisl ,
C. H. Morawe  and
H. Zabel
Tim Salditt
Affiliation:
Sektion Physik der Ludwig-Maximilians-Universität München, Geschwister-Scholl-Platz 1, 80539 München, Germany
T. H. Metzger
Affiliation:
Sektion Physik der Ludwig-Maximilians-Universität München, Geschwister-Scholl-Platz 1, 80539 München, Germany
J. Peisl
Affiliation:
Sektion Physik der Ludwig-Maximilians-Universität München, Geschwister-Scholl-Platz 1, 80539 München, Germany
C. H. Morawe
Affiliation:
Institut für Experimentalphysik-Festkörperphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany
H. Zabel
Affiliation:
Institut für Experimentalphysik-Festkörperphysik, Ruhr-Universität Bochum, 44780 Bochum, Germany
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Abstract

We present measurements of specular and nonspecular x-ray scattering from interfacial roughness in ND/Al2O3 multilayers grown by rf-sputtering on a sapphire substrate at different Ar pressures. The rms-roughness of the interfaces is found to increase drastically if the Ar pessure is raised above a critical value corresponding to the thermalization of the impinging atoms. At the same time the height-height correlation function of the interfaces changes from a non-self-affine to a self-affine form. This result can be deduced from the structure factor of the diffuse scattering measured over a wide range in parallel momentum transfer.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 355: Symposium B1 – Evolution of Thin-Film and Surface Structure and Morphology , 1994 , 269
Copyright
Copyright © Materials Research Society 1995

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References

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