Hostname: page-component-848d4c4894-4hhp2 Total loading time: 0 Render date: 2024-06-11T02:55:03.936Z Has data issue: false hasContentIssue false

Surface Morphology of GaN: Flat Versus Vicinal Surfaces

Published online by Cambridge University Press:  03 September 2012

M.H. Xie
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
S.M. Seutter
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
L.X. Zheng
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
S.H. Cheung
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
Y.F. Ng
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
Huasheng Wu
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
S.Y. Tong
Affiliation:
Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong
Get access

Abstract

The surface morphology of GaN films grown by molecular beam epitaxy (MBE) is investigated by scanning tunneling microscopy (STM). A comparison is made between flat and vicinal surfaces. The wurtzite structure of GaN leads to special morphological features such as step pairing and triangularly shaped islands. Spiral mounds due to growth at screw threading dislocations are dominant on flat surfaces, whereas for vicinal GaN, the surfaces show no spiral mound but evenly spaced steps. This observation suggests an effective suppression of screw threading dislocations in the vicinal films. This finding is confirmed by transmission electron microscopy (TEM) studies. Continued growth of the vicinal surface leads to step bunching that is attributed to the effect of electromigration.

Type
Research Article
Copyright
Copyright © Materials Research Society 1999

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Strite, S. and Morkoc, H., J. Vac. Sci. Technol., B10, 1237 (1992)Google Scholar
2. Zhang, Z. and Lagally, M. G. (eds.), Morphological Organization in Epitaxial Growth and Removal, World Scientific, Singapore, 1998 Google Scholar
3. Seutter, S. M., Xie, M. H., Zhu, W. K., Zheng, L. X., Wu, Huasheng, and Tong, S. Y., Surf. Sci. Lett.,(in press)Google Scholar
4. Burton, W. K., Cabrera, N., and Frank, F. C., Phil. Trans. Roy. Soc., 243, 299 (1951)Google Scholar
5. Xie, M. H., Zheng, L. X., Ng, Y. F., Wu, Huasheng, Ohtani, N., and Tong, S. Y., unpublishedGoogle Scholar
6. Heying, B., Tarsa, E. J., Elsass, C. R., Fini, P., DenBaars, S. P. and Speck, J. S., J. Appl. Phys., 85, 6470 (1999)Google Scholar
7. Smith, A. R., feenstra, R. M., Greve, D. W., Shin, M. S., Skowronski, M., Neugebauer, J. and Northrup, J. E., J. Vac. Sci. Technol., B16, 2242 (1998)Google Scholar
8. Xie, M. H., Seutter, S. M., Zhu, W. K., Zheng, L. X., Wu, Huasheng, and Tong, S. Y., Phys. Rev. Lett., 82, 2749 (1999)Google Scholar
9. Xie, M. H., Zheng, L. X., Tong, S. Y., unpublishedGoogle Scholar
10. Bennema, P., and Gilmer, G. H., in Crystal Growth: An Introduction (ed. Hartman, P.), North-Holland, 1973, p263 Google Scholar
11. Xie, M.H., Cheung, S.H., Zheng, L.X., Ng, Y.F., Huasheng Wu, Ohtani, N., and Tong, S.Y., unpublishedGoogle Scholar
12. Latyshev, A. V., Aseev, A. L., Krasilnikov, A. B., and Stenin, S. I., Surf. Sci., 213, 157(1989)Google Scholar