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F23 A Novel TXRF Instrumentation for Contamination Control on 300 mm Silicon Wafers Employing Synchrotron Radiation

Published online by Cambridge University Press:  20 May 2016

B. Beckhoff ,
R. Fliegauf ,
G. Ulm ,
J. Weser ,
T. Ehmann ,
L. Fabry ,
C. Mantler  and
S. Pahlke
B. Beckhoff
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
R. Fliegauf
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
G. Ulm
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
J. Weser
Affiliation:
Physikalisch-Technische Bundesanstalt, Berlin, Germany
T. Ehmann
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
L. Fabry
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
C. Mantler
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
S. Pahlke
Affiliation:
Wacker Siltronic AG, Burghausen, Germany
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Abstract

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Type
Denver X-Ray Conference
Information
Powder Diffraction , Volume 18 , Issue 2 , June 2003 , pp. 177
Copyright
Copyright © Cambridge University Press 2003

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