Skip to content

Your Cart


You have 0 items in your cart.

Register Sign in Wishlist
Ferroelectric Thin films V

Ferroelectric Thin films V

Volume 433

$31.99 (C)

Part of MRS Proceedings

  • Date Published: November 1996
  • availability: Temporarily unavailable - available from TBC
  • format: Hardback
  • isbn: 9781558993365

$ 31.99 (C)

Temporarily unavailable - available from TBC
Notify me when available Add to wishlist

Looking for an examination copy?

If you are interested in the title for your course we can consider offering an examination copy. To register your interest please contact providing details of the course you are teaching.

Product filter button
About the Authors
  • This book features worldwide advancements that have been made in both the processing technology and fundamental understanding of ferroelectric thin films. There is a strong emphasis on process integration issues and on gaining an enhanced understanding of the behavior of layered structure perovskites for nonvolatile memory applications. The book also addresses the processing of high-dielectric constant thin films for dynamic random-access memory applications, especially by plasma-assisted metalorganic chemical vapor deposition. The development of electrode-processing techniques for improved properties, the role of defects in ferroelectric thin-film degradation, structure-property relationships, domains and size effects in ferroelectric thin films, and the pyroelectric, optical and field effect device applications of these materials are also highlighted. The perspectives of ARPA and ONR on the future of ferroelectric technologies are noted.

    Customer reviews

    Not yet reviewed

    Be the first to review

    Review was not posted due to profanity


    , create a review

    (If you're not , sign out)

    Please enter the right captcha value
    Please enter a star rating.
    Your review must be a minimum of 12 words.

    How do you rate this item?


    Product details

    • Date Published: November 1996
    • format: Hardback
    • isbn: 9781558993365
    • dimensions: 230 x 156 mm
    • weight: 0.795kg
    • availability: Temporarily unavailable - available from TBC
  • Editors

    Seshu B. Desu, Virginia Tech Blacksburg

    Robert E. Jones, Motorola Austin, Texas

    R. Ramesh, University of Maryland, College Park

    Bruce A. Tuttle, Sandia National Laboratories, Alburquerque

    In K. Yoo, Samsung Advanced Institute of Technology Suwon

Sign In

Please sign in to access your account


Not already registered? Create an account now. ×

Sorry, this resource is locked

Please register or sign in to request access. If you are having problems accessing these resources please email

Register Sign in
Please note that this file is password protected. You will be asked to input your password on the next screen.

» Proceed

You are now leaving the Cambridge University Press website. Your eBook purchase and download will be completed by our partner Please see the permission section of the catalogue page for details of the print & copy limits on our eBooks.

Continue ×

Continue ×

Continue ×

Find content that relates to you

Are you sure you want to delete your account?

This cannot be undone.


Thank you for your feedback which will help us improve our service.

If you requested a response, we will make sure to get back to you shortly.

Please fill in the required fields in your feedback submission.