Skip to main content Accessibility help
×
Hostname: page-component-76fb5796d-25wd4 Total loading time: 0 Render date: 2024-04-25T07:36:38.807Z Has data issue: false hasContentIssue false

1 - Introduction

Published online by Cambridge University Press:  05 April 2016

Jean-Pierre Colinge
Affiliation:
Taiwan Semiconductor Manufacturing Company Limited (TSMC)
James C. Greer
Affiliation:
Tyndall National Institute, Ireland
Get access

Summary

The history of electronics spans over more than a century. A key milestone in the history of electronics was the invention of the telephone in 1876 and patents for the device were filed independently by Elisha Gray and Alexander Graham Bell on 14 February that same year. Bell filed first, and thus the patent was granted to him. This timely, or untimely for Gray, coincidence has become a textbook example for teaching the importance of intellectual property law in engineering schools across the globe.

Years later, the first radio broadcast took place in 1910 and is credited to the De Forest Radio Laboratory, New York. Lee De Forest, inventor of the electron vacuum tube, arranged the world's first radio broadcast featuring legendary tenor Enrico Caruso along with other stars of the New York Metropolitan Opera to several receiving locations within the city. Experimental television broadcasts can be traced back to 1928, but practical TV sets and regular broadcasts date back to shortly after the Second World War.

During this initial phase of development, electronics was based on vacuum tubes and electromechanical devices. The first transistor was invented at Bell Labs by William Shockley, John Bardeen, and Walter Brattain in 1947 and they used a structure named a point-contact transistor. Two gold contacts acted as emitter and collector contacts on a piece of germanium. William Shockley made and patented the first bipolar junction transistor in the following year, 1948. It is worth noting that the point-contact transistor was independently invented by German physicists Herbert Mataré and Heinrich Welker of the Compagnie des Freins et Signaux, a Westinghouse subsidiary located in Paris [1].

The first patent for a metal-oxide-semiconductor field-effect transistor (MOSFET) was filed by Julius Edgar Lilienfeld in Canada and in the USA during 1925 and 1928, respectively [2,3]. The semiconductor material used in the patent was copper sulfide and the gate insulator was alumina. However, a working device was never successfully fabricated or published at that time. The first functional MOSFET was made by Dawon Kang and John Atalla in 1959 and patented later in 1963 [4]. The successful field-effect operation was enabled by the use of silicon and silicon dioxide for the metal-oxide-semiconductor (MOS) stack.

Type
Chapter
Information
Nanowire Transistors
Physics of Devices and Materials in One Dimension
, pp. 1 - 17
Publisher: Cambridge University Press
Print publication year: 2016

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

[1] http://en.wikipedia.org/wiki/Transistor
[2] Lilienfeld, J.E., “Method and apparatus for controlling electric current,” US patent 1745175, first filed in Canada on 22 October 1925.
[3] Lilienfeld, J.E., “Device for controlling electric current,” US patent 1900018, filed on 28 March 1928.
[4] Kahng, Dawon, “Electric field controlled semiconductor device,” US Patent 3,102,230, filed on 27 August 1963.
[5] Bower, R.W., Dill, R.G., “Insulated gate field effect transistors fabricated using the gate as source-drain mask,” International Electron Device Meeting (IEDM) Technical Digest, pp. 102–104 (1966).
[6] Wanlass, F., Sah, C., “Nanowatt logic using field-effect metal-oxide semiconductor triodes,” IEEE International Solid-State Circuits Conference, Digest of Technical Papers, p. 6 (1963).
[7] Moore, G.E., “Cramming more components onto integrated circuits,” Electronics 38, pp. 114–117 (1965), also reprinted in Proceedings of the IEEE86(1), pp. 82–85 (1998).Google Scholar
[8] Colinge, C.A., Colinge, J.P., Physics of Semiconductor Devices, Kluwer Academic Publishers (now: Springer), p. 196 (2002).
[9] Armstrong, G.A., Davis, J.R., Doyle, A., “Characterization of bipolar snapback and breakdown voltage in thin-film SOI transistors by two-dimensional simulation,” IEEE Transactions on Electron Devices 38, pp. 328–336 (1991).Google Scholar
[10] Moselund, K.E.et al., “Punch-through impact ionization MOSFET (PIMOS): from device principle to applications,” Solid-State Electronics 52, pp. 1336–1344 (2008).Google Scholar
[11] Zhang, Q., Zhao, W., Seabaugh, A., “Low-subthreshold-swing tunnel transistors,” IEEE Electron Device Letters 27, pp. 297–300 (2006).Google Scholar
[12] Lu, H., Seabaugh, A., “Tunnel field-effect transistors: state-of-the-art,” IEEE Journal of the Electron Device Society 2(4), pp. 44–49 (2014).Google Scholar
[13] Afzalian, A., Colinge, J.P., Flandre, D., “Physics of gate modulated resonant tunneling (RT)-FETs: multi-barrier MOSFET for steep slope and high on-current,” Solid-State Electronics 59, pp. 50–61 (2011).Google Scholar
[14] Salahuddin, S., Datta, S., “Use of negative capacitance to provide voltage amplification for low power nanoscale devices,” Nano Letters 8, pp. 405–410 (2008).Google Scholar
[15] Zhirnov, V.V., Cavin, R.K., “Nanoelectronics: negative capacitance to the rescue?,” Nature Nanotechnology 3(2), pp. 77–78 (2008).Google Scholar
[16] Salahuddin, S., Datta, S.,“Can the subthreshold swing in a classical FET be lowered below 60 mV/decade?,” Technical Digest of the International Electron Devices Meeting (IEDM), pp. 693–696 (2008).
[17] Dennard, R.H.et al., “Design of ion-implanted MOSFETs with very small physical dimensions,” IEEE Journal of Solid-State Circuits 9(5), pp. 256–268 (1974).Google Scholar
[18] Skotnicki, T., Boeuf, F., “How can high-mobility channel materials boost or degrade performance in advanced CMOS,” Proceedings VLSI Symposium, pp. 153–154 (2010).
[19] Colinge, J.P., Silicon-on-Insulator Technology: Materials to VLSI, edition, Kluwer Academic Publishers (2004).
[20] Kononchuk, O., Nguyen, B.-Y. (eds.), Silicon-On-Insulator (SOI) Technology: Manufacture and Applications, Elsevier (2014).
[21] Colinge, C.A., Colinge, J.P., Physics of Semiconductor Devices, Kluwer Academic Publishers (now: Springer), pp. 51–55 (2002).
[22] Rahman, A.et al., “Theory of ballistic nanotransistors,” IEEE Transactions on Electron Devices 50(9), pp. 1853–1864 (2003).Google Scholar
[23] Natori, K., “Ballistic metal-oxide-semiconductor field effect transistor,” Journal of Applied Physics 76(8), pp. 4879–4890 (1994).Google Scholar
[24] Lundstrom, M.S., Ren, Z., “Essential physics of carrier transport in nanoscale MOSFETs,” IEEE Transactions on Electron Devices 49(1), pp. 133–141 (2002).Google Scholar
[25] Khakifirooz, A., Nayfeh, O.M., Antoniadis, D., “A simple semiempirical short-channel MOSFET current–voltage model continuous across all regions of operation and employing only physical parameters,” IEEE Transactions on Electron Devices 56(8), pp. 1674–1680 (2009).Google Scholar
[26] Majumdar, A., Antoniadis, D.A., “Analysis of carrier transport in short-channel MOSFETs,” IEEE Transactions on Electron Devices 61(2), pp. 351–358 (2014).Google Scholar
[27] Lundstrom, M.S., Antoniadis, D.A., “Compact models and the physics of nanoscale FETs,” IEEE Transactions on Electron Devices 61(2), pp. 225–233 (2014).Google Scholar
[28] Wang, R.et al., “Experimental investigations on carrier transport in Si nanowire transistors: ballistic efficiency and apparent mobility,” IEEE Transactions on Electron Devices 55(11), pp. 2960–2967 (2008).Google Scholar
[29] Rodwell, M.J.W.et al., “III-V MOSFETs: scaling laws, scaling limits, fabrication processes,” Proceedings of International Conference on Indium Phosphide & Related Materials (IPRM), pp. 1–6 (2010).
[30] Salmani-Jelodar, M.et al., “Transistor roadmap projection using predictive full-band atomistic modeling,” Applied Physics Letters 105, pp. 083508.1–4 (2014).Google Scholar

Save book to Kindle

To save this book to your Kindle, first ensure coreplatform@cambridge.org is added to your Approved Personal Document E-mail List under your Personal Document Settings on the Manage Your Content and Devices page of your Amazon account. Then enter the ‘name’ part of your Kindle email address below. Find out more about saving to your Kindle.

Note you can select to save to either the @free.kindle.com or @kindle.com variations. ‘@free.kindle.com’ emails are free but can only be saved to your device when it is connected to wi-fi. ‘@kindle.com’ emails can be delivered even when you are not connected to wi-fi, but note that service fees apply.

Find out more about the Kindle Personal Document Service.

Available formats
×

Save book to Dropbox

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Dropbox.

Available formats
×

Save book to Google Drive

To save content items to your account, please confirm that you agree to abide by our usage policies. If this is the first time you use this feature, you will be asked to authorise Cambridge Core to connect with your account. Find out more about saving content to Google Drive.

Available formats
×