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Highly (111)-oriented and conformal iridium films by liquid source metalorganic chemical vapor deposition

Published online by Cambridge University Press:  31 January 2011

Jaydeb Goswami ,
Chang-Gong Wang ,
Prashant Majhi ,
Yong-Wook Shin  and
Sandwip K. Dey
Jaydeb Goswami
Affiliation:
Department of Chemical and Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287–6006
Chang-Gong Wang
Affiliation:
Department of Chemical and Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287–6006
Prashant Majhi
Affiliation:
Department of Chemical and Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287–6006
Yong-Wook Shin
Affiliation:
Department of Chemical and Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287–6006
Sandwip K. Dey
Affiliation:
Department of Chemical and Materials Engineering and Center for Solid State Electronics Research, Arizona State University, Tempe, Arizona 85287–6006
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Abstract

Highly (111)-oriented and conformal iridium (Ir) films were deposited by a liquid source metalorganic-chemical-vapor-deposition process on various substrates. An oxygen-assisted pyrolysis of (methylcyclopentadienyl) (1,5-cyclooctadiene) Ir precursor at a wide range of substrate temperatures (Tsub) between 300 and 700 °C was used. At a low Tsub of 350 °C, the randomly oriented polycrystalline films exhibited an I111/I200 x-ray intensity ratio of 6. However, the films deposited at Tsub = 700 °C on native SiO2 and amorphous SiO2 surfaces were highly oriented with the I111/I200 ratios of 277 and 186, respectively. The transmission electron microscopy study revealed continuous, dense, and faceted microstructures of Ir films. Also, the step coverage of Ir on TiN (64%) was higher than that on amorphous SiO2 (50%) surfaces.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 16 , Issue 8 , August 2001 , pp. 2192 - 2195
Copyright
Copyright © Materials Research Society 2001

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