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    Satriano, Cristina Marletta, Giovanni and Kasemo, Bengt 2008. Oxygen plasma-induced conversion of polysiloxane into hydrophilic and smooth SiOx surfaces. Surface and Interface Analysis, Vol. 40, Issue. 3-4, p. 649.


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Initial stages of silicate growth on and oxidation of graphite: A model for composites

  • Dawn A. Bonnell (a1), Darrin Jiron (a1) and Timothy Flinn (a1)
  • DOI: http://dx.doi.org/10.1557/JMR.1998.0029
  • Published online: 01 January 2011
Abstract

The initial stages of silicate growth on graphite are characterized with atomic force microscopy. The morphological development indicates that decomposition of tetra ethyloxysilane at low pressure produces films of 3 nm clusters located at undercoordinated carbon sites. Clusters eventually cover the surface, at which point a second layer grows. In higher pressure deposition multiple layers of clusters grow simultaneously. A comparison of the oxidation behavior of surfaces with defects completely and incompletely terminated with SiOx shows that edge recession is the primary oxidation mechanism and that the site specificity of SiOx is effective in inhibiting oxidation.

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Journal of Materials Research
  • ISSN: 0884-2914
  • EISSN: 2044-5326
  • URL: /core/journals/journal-of-materials-research
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