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Synthesis and properties of p-type nitrogen-doped ZnO thin films by pulsed laser ablation of a Zn-rich Zn3N2 target

  • A. Allenic (a1), W. Guo (a1), Y.B. Chen (a1), G.Y. Zhao (a1), X.Q. Pan (a1), Y. Che (a2), Z.D. Hu (a2) and B. Liu (a2)...

Epitaxial ZnO thin films doped uniformly with nitrogen at 1020 atoms/cm3 were fabricated by pulsed laser ablation of a Zn-rich Zn3N2 target. The films grown at 300 °C and annealed at 600 °C in O2 showed p-type conductivity. Two acceptor levels at 105 and 224 meV were determined by temperature-dependent Hall and photoluminescence measurements of the p-type samples. Transmission electron microscopy studies revealed that the p-type ZnO films consist of 10–20 nm columnar grains with a high density of defects and grain boundaries that may facilitate the annihilation of native donors and the activation of acceptors during postdeposition annealing.

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Journal of Materials Research
  • ISSN: 0884-2914
  • EISSN: 2044-5326
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