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Texture size control by mixing glass microparticles with alkaline solution for crystalline silicon solar cells

  • Cong Thanh Nguyen (a1), Koichi Koyama (a1), Huynh Thi Cam Tu (a1), Keisuke Ohdaira (a1) and Hideki Matsumura (a1)...
Abstract

In this paper, we show a novel method to obtain small size textures usable in crystalline silicon (c-Si) solar cells. SiO2-based glass microparticles are mixed with a conventional KOH-based alkaline solution for making the textures. Using this mixing method, the texture size can be drastically reduced from 10 to ≤2 µm (0.3–2 µm). In addition, the process time and c-Si loss during the texture formation are reduced from 25 to 2 min and from 20 to 2 µm, respectively. Thus, the process is applicable to c-Si with thickness down to 50 µm. High-quality passivation showing the effective minority carrier lifetimes (τeff) larger than several ms and effective antireflection coating are possible on the new textures. The process is named “microparticle-assisted texturing (MPAT) process”, and its features are also demonstrated.

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Corresponding author
a)Address all correspondence to these authors. e-mail: nguyen.cong.thanh@jaist.ac.jp
b)e-mail: h-matsu@jaist.ac.jp
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c)

Present address: ULVAC, Inc. (ULVAC), Chigasaki, Kanagawa 253-8543, Japan.

This paper has been selected as an Invited Feature Paper.

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5.Nguyen, C.T., Koyama, K., Higashimine, K., Terashima, S., Okamoto, C., Sugiyama, S., Ohdaira, K., and Matsumura, H.: Novel chemical cleaning of textured crystalline silicon for realizing surface recombination velocity <0.2 cm/s using passivation catalytic CVD SiNx/amorphous silicon stacked layers. Jpn. J. Appl. Phys. 56, 56502 (2017).
6.Koyama, K., Ohdaira, K., and Matsumura, H.: Extremely low surface recombination velocities on crystalline silicon wafers realized by catalytic chemical vapor deposited SiNx/a-Si stacked passivation layers. Appl. Phys. Lett. 97, 82108 (2010).
7.Seidel, H., Csepregi, L., Heuberger, A., and Baumgärtel, H.: Anisotropic etching of crystalline silicon in alkaline solutions. J. Electrochem. Soc. 137, 3612 (1990).
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Journal of Materials Research
  • ISSN: 0884-2914
  • EISSN: 2044-5326
  • URL: /core/journals/journal-of-materials-research
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