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Atomic Resolution Phase Contrast Imaging and In-Line Holography Using Variable Voltage and Dose Rate

Published online by Cambridge University Press:  22 October 2012

Bastian Barton ,
Bin Jiang ,
ChengYu Song ,
Petra Specht ,
Hector Calderon  and
Christian Kisielowski
Bastian Barton
Affiliation:
Materials Science Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA
Bin Jiang
Affiliation:
FEI Company, 5350 NE Dawson Creek Drive, Hillsboro, OR 97124, USA
ChengYu Song
Affiliation:
National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA
Petra Specht
Affiliation:
Department of Materials Science and Engineering, University of California at Berkeley, Hearst Mining Bldg., Berkeley, CA 94720, USA
Hector Calderon
Affiliation:
Escuela Superior de Física y Matemáticas, IPN, Ed. 9 UPALM Zacatenco, D.F. 07738, Mexico
Christian Kisielowski*
Affiliation:
National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA Joint Center for Artificial Photosynthesis, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, CA 94720, USA
*
*Corresponding author. E-mail cfkisielowski@lbl.gov
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Abstract

The TEAM 0.5 electron microscope is employed to demonstrate atomic resolution phase contrast imaging and focal series reconstruction with acceleration voltages between 20 and 300 kV and a variable dose rate. A monochromator with an energy spread of ≤0.1 eV is used for dose variation by a factor of 1,000 and to provide a beam-limiting aperture. The sub-Ångstrøm performance of the instrument remains uncompromised. Using samples obtained from silicon wafers by chemical etching, the [200] atom dumbbell distance of 1.36 Å can be resolved in single images and reconstructed exit wave functions at 300, 80, and 50 kV. At 20 kV, atomic resolution <2 Å is readily available but limited by residual lens aberrations at large scattering angles. Exit wave functions reconstructed from images recorded under low dose rate conditions show sharper atom peaks as compared to high dose rate. The observed dose rate dependence of the signal is explained by a reduction of beam-induced atom displacements. If a combined sample and instrument instability is considered, the experimental image contrast can be matched quantitatively to simulations. The described development allows for atomic resolution transmission electron microscopy of interfaces between soft and hard materials over a wide range of voltages and electron doses.

Keywords

in-line electron holographyaberration-corrected TEMhigh-resolution TEMlow voltage TEMlow dose TEMmonochromatorexit wave reconstructionfocal serieslattice phonons
Type
Techniques and Equipment Development
Information
Microscopy and Microanalysis , Volume 18 , Issue 5 , October 2012 , pp. 982 - 994
Copyright
Copyright © Microscopy Society of America 2012

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