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Analytical TEM Characterization of Source/Drain Contacts in Advanced Semiconductor Devices

  • J. Li (a1), H. Niimi (a2), O. Gluschenkov (a1), P. Adusumilli (a1), J. Fronheiser (a2), S. Mochizuki (a1), Z. Liu (a1), V. Kamineni (a2), M. Raymond (a2), A. V Carr (a1), T. Yamashita (a1), B. Veeraraghavan (a1), N. Saulnier (a1) and J. Gaudiello (a1)...
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Abstract

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References

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[1] Niimi, H., et al, IEEE Electron Device Letters 2016 1371.
[2] Gluschenkov, O., et al, IEEE IEDM Technical Digest 2016 448.
[3] Kamineni, V., et al, IEEE IITC/AMC 2016 105.
[4] Xie, R., et al, IEEE IEDM Technical Digest 2016 47.
[5] Narasimha, S., et al, IEEE IEDM Technical Digest 2017 689.
[6] Auth, C., et al, IEEE IEDM Technical Digest 2017 673.
[7] This work was performed by the Research Alliance teams at various IBM Research and Development Facilities.
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Microscopy and Microanalysis
  • ISSN: 1431-9276
  • EISSN: 1435-8115
  • URL: /core/journals/microscopy-and-microanalysis
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