Hostname: page-component-8448b6f56d-tj2md Total loading time: 0 Render date: 2024-04-19T14:15:48.979Z Has data issue: false hasContentIssue false
  • English
  • Français

Atomic Scale Analysis of Dopants in CMOS Structures by Atom Probe Tomography

Published online by Cambridge University Press:  25 July 2016

Isabelle Martin ,
Robert Estivill ,
Marc Juhel ,
Adeline Grenier ,
Ty J. Prosa  and
David J. Larson
Isabelle Martin
Affiliation:
CAMECA Instruments, Inc., Madison, WI, 53711USA
Robert Estivill
Affiliation:
STMicroelectronics, Crolles, 38926France Univ. Grenoble Alpes, Grenoble, 38000France Univ. de Rouen, Groupe de Physique des Matériaux, 76800France
Marc Juhel
Affiliation:
STMicroelectronics, Crolles, 38926France
Adeline Grenier
Affiliation:
Univ. Grenoble Alpes, Grenoble, 38000France
Ty J. Prosa
Affiliation:
CAMECA Instruments, Inc., Madison, WI, 53711USA
David J. Larson
Affiliation:
CAMECA Instruments, Inc., Madison, WI, 53711USA

Abstract

An abstract is not available for this content so a preview has been provided. As you have access to this content, a full PDF is available via the ‘Save PDF’ action button.
Image of the first page of this content. For PDF version, please use the ‘Save PDF’ preceeding this image.'
Type
Abstract
Information
Microscopy and Microanalysis , Volume 22 , Supplement S3: Proceedings of Microscopy & Microanalysis 2016 , July 2016 , pp. 1534 - 1535
Copyright
© Microscopy Society of America 2016 

References

References:

[1] Kelly, T.F. & Miller, M.K. Rev Sci Instrum 78 (2007). p. 031101.CrossRefGoogle Scholar
[2] Jin, S., etal, J Vac Sci Technol B 29 (2011). p. 061203.CrossRefGoogle Scholar
[3] Vurpillot, F., et al, Ultramicroscopy 111 (2011). p. 1286.CrossRefGoogle Scholar