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Atomic-scale Mechanisms of Defect-Induced Retention Failure in Ferroelectric Materials

Published online by Cambridge University Press:  23 September 2015

L. Li ,
L. Xie ,
Y. Zhang ,
J. R. Jokisaari ,
H.M. Christen  and
X. Q. Pan
L. Li
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, United States
L. Xie
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, United States
Y. Zhang
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, United States
J. R. Jokisaari
Affiliation:
Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, United States
H.M. Christen
Affiliation:
Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States
X. Q. Pan
Affiliation:
Department of Chemical Engineering and Materials Science and Department of Physics and Astronomy, University of California - Irvine, Irvine, CA 92697, US

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 21 , Supplement S3: Proceedings of Microscopy & Microanalysis 2015 , August 2015 , pp. 1307 - 1308
Copyright
Copyright © Microscopy Society of America 2015 

References

References:

[1]. Li, L., et al., Nano Letters (2013) 13(11), 5218–5223.Google Scholar
[2]. The authors gratefully acknowledge the financial support through DOE grant DoE/BES DE-FG02-07ER46416..Google Scholar