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Damage-less Chemical State Analysis by Using Soft X-ray Emission Spectroscopy in Low Voltage SEM

Published online by Cambridge University Press:  04 August 2017

Y. Sakuda ,
M. Ishizaki ,
T. Togashi ,
S. Asahina ,
M. Takakura ,
H. Takahashi  and
M. Kurihara
Y. Sakuda
Affiliation:
JEOL Ltd., Akisima, Tokyo, Japan Yamagata University, Yamagata, Japan
M. Ishizaki
Affiliation:
Yamagata University, Yamagata, Japan
T. Togashi
Affiliation:
Yamagata University, Yamagata, Japan
S. Asahina
Affiliation:
JEOL Ltd., Akisima, Tokyo, Japan
M. Takakura
Affiliation:
JEOL Ltd., Akisima, Tokyo, Japan
H. Takahashi
Affiliation:
JEOL Ltd., Akisima, Tokyo, Japan
M. Kurihara
Affiliation:
Yamagata University, Yamagata, Japan

Abstract

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Type
Abstract
Information
Microscopy and Microanalysis , Volume 23 , Supplement S1: Proceedings of Microscopy & Microanalysis 2017 , July 2017 , pp. 1842 - 1843
Copyright
© Microscopy Society of America 2017 

References

[1] Asahina, S., et al, APL Materials 2 2014). p. 113317. doi: 10.1063/1.4902435.CrossRefGoogle Scholar
[2] Gotoh, A., et al, Nanotechnology 18 2007). doi: 10.1088/0957-4484/18/34/345609.Google Scholar