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Electron Channeling Contrast Imaging for Non-Destructive Analysis of Extended Defects in Semiconductor Thin Films and Device Structures

Published online by Cambridge University Press:  27 August 2014

M.B. Katz
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010
M.E. Twigg
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010
S.I. Maximenko
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010
N.D. Bassim
Affiliation:
Materials Science & Technology Division, United States Naval Research Laboratory, Washington, DC 2.0010
N.A. Mahadik
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010
G.G. Jernigan
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010
C.L. Canedy
Affiliation:
Optical Sciences Division, United States Naval Research Laboratory, Washington, DC 20010
J. Abell
Affiliation:
Optical Sciences Division, United States Naval Research Laboratory, Washington, DC 20010
C.A. Affouda
Affiliation:
Electronics Science & Technology Division, United States Naval Research Laboratory, Washington, DC 20010

Abstract

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Type
Abstract
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Crimp, M.A. Microscopy Research and Techniques 69 (2006) 374.Google Scholar
[2] Picard, Y.N., et al., Appl. Phys. Lett. 90 (2007) 234101.Google Scholar
[3] Twigg, M.E. and Picard, Y.N., J. Appl. Phys. 105 (2009) 093520.Google Scholar
[4] The authors would like to thank the NRL Institute for Nanoscience for maintenance of the SEM instrument. MBK would like to thank J.K. Hite at NRL for assistance with ECCI.Google Scholar