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Improved SEM Image Resolution Through the Use of Image RestorationTechniques

Published online by Cambridge University Press:  27 August 2014

Eric Lifshin ,
Yudhishthir P. Kande ,
Richard L. Moore  and
Siwei Lyu
Eric Lifshin
Affiliation:
College of Nanoscale Science and Engineering, University at Albany, State University of New York, Albany, NY, USA
Yudhishthir P. Kande
Affiliation:
College of Nanoscale Science and Engineering, University at Albany, State University of New York, Albany, NY, USA
Richard L. Moore
Affiliation:
RLM2 Analytical, Albany, NY, USA
Siwei Lyu
Affiliation:
Department of Computer Science, University at Albany, State University of New York, Albany, NY, USA

Abstract

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Abstract
Information
Microscopy and Microanalysis , Volume 20 , Supplement S3: Proceedings of Microscopy & Microanalysis 2014 , August 2014 , pp. 12 - 13
Copyright
Copyright © Microscopy Society of America 2014 

References

[1] Castleman, K.R. Digital Image Processing (1996) Englewood Cliffs, NJ; Prentice Hall.Google Scholar
[2] Liddle, J. A., et. al. Probe Shape Measurements in an Electron Lithography Systems (2004), J. VacSci Technol B 22(6), 2897-2901.Google Scholar
[3] The authors acknowledge the support of Mr. Jeffrey Moskin, President of Nanojehm for providing the resources that made this study possible as well as TESCAN for providing instrumental support.Google Scholar