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Unveiling the Ferroelectric Behavior of HfO2 Thin Films Using Fast DualEELS Analysis

Published online by Cambridge University Press:  05 August 2019

Paolo Longo ,
Paola Favia ,
Mihaela Popovici ,
Bart Vermeulen ,
Liam Spillane  and
Ray D Twesten
Paolo Longo*
Affiliation:
Gatan Inc., Pleasanton CA, USA.
Paola Favia
Affiliation:
Imec, Leuven, Belgium.
Mihaela Popovici
Affiliation:
Imec, Leuven, Belgium.
Bart Vermeulen
Affiliation:
Imec, Leuven, Belgium. Institut voor Kern- en Stralingsfysica, KU Leuven, Leuven, Belgium.
Liam Spillane
Affiliation:
Gatan Inc., Pleasanton CA, USA.
Ray D Twesten
Affiliation:
Gatan Inc., Pleasanton CA, USA.
*
*Corresponding author: plongo@gatan.com

Abstract

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Type
Current Trends and Challenges in Electron Energy-Loss Spectroscopy
Information
Microscopy and Microanalysis , Volume 25 , Supplement S2 , August 2019 , pp. 588 - 589
Copyright
Copyright © Microscopy Society of America 2019 

References

[1]Grimley, ED et al. , Advanced Materials Interfaces 5 (2018), p. 1701258.Google Scholar