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Integrating 2D electron gas oxide heterostructures on silicon using rare-earth titanates

  • Eric N. Jin (a1), Lior Kornblum (a1), Charles H. Ahn (a1) (a2) and Frederick J. Walker (a1)
Abstract
ABSTRACT

Integrating oxide heterostructures on silicon has the potential to leverage the multifunctionalities of oxide systems into semiconductor device technology. We present the growth and characterization of two-dimensional electron gas (2DEG) oxide systems LaTiO3/SrTiO3 (LTO/STO) and GdTiO3/SrTiO3 (GTO/STO) on Si(001). We show interface-based conductivity in the oxide films and measure high electron densities ranging from ∼9 × 1013 cm-2 interface-1 in GTO/STO/Si to ∼9 × 1014 cm-2 interface-1 in LTO/STO/Si. We attribute the higher measured carrier density in the LTO/STO films to a higher concentration of interface-bound oxygen vacancies arising from a lower oxygen partial pressure during growth. These vacancies donate conduction electrons and result in an increased measured carrier density. The integration of such 2DEG oxide systems with silicon provides a bridge between the diverse electronic properties of oxide systems and the established semiconductor platform and points toward new devices and functionalities.

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*Corresponding author: eric.jin@yale.edu
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