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Film Synthesis on Powders by Cathodic ARC Plasma Deposition

Published online by Cambridge University Press:  21 February 2011

Simone Anders
Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
Ian G. Brown
Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720
Igor C. Ivanov
Charles Evans & associates, 301 Chesapeake Drive, Redwood City, CA 94063
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Cathodic arc plasma deposition was used to coat Al2O3 powder (mesh size 60) with platinum. the power particles were moved during deposition using a mechanical system operating at a resonance frequency of 20 Hz. Scanning electron microscopy and auger electron microscopy show that all particles are completely coated with a platinum film having a thickness of about 100 nm. the actual deposition time was only 20 s, thus the deposition rate was very high (5 nm/s).

Research Article
Copyright © Materials Research Society 1995

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1 Powell, C. F., Oxley, J. H., and Blocher, J. M. Jr., Vapour Deposition, (Wiley, New York, 1966).Google Scholar
2 Itoh, H., Hattoria, K. and Naka, S., J. Mater. Sci. 24, 3643 (1989).CrossRefGoogle Scholar
3 Khan, H. R. and Frey, H., J. of the Less-Common Metals 175, 177 (1991).CrossRefGoogle Scholar
4 Garg, A. K. and De Jonghe, L. C., J. Mater. Res. 5, 136 (1990).CrossRefGoogle Scholar
5 Kim, W.-J., Moon, Y. T., Kim, C. H., Kim, D. K., Lee, H.-W., J. Mater. Sci. Lett. 13, 1349 (1994).CrossRefGoogle Scholar
6 Lafferty, J. M. (Editor), Vacuum arcs, (Wiley interscience, New York, 1980).Google Scholar
7 Jüttner, B., IEEE Trans. Plasma Sci. 15, 474 (1987).CrossRefGoogle Scholar
8 Mesyats, G. A. and Proskurovsky, D. I., Pulsed Electrical Discharge in Vacuum, (Springer,Berlin, 1989).CrossRefGoogle Scholar
9 Anders, A., Anders, S., Jüttner, B., Bötticher, W., Lück, H., and Schröder, G., IEEE Trans.Plasma Sci. 20, 466 (1992).CrossRefGoogle Scholar
10 Martin, P. J., Netterfield, R. P., and Kinder, T. J., Thin Solid Films 193, 77 (1990).CrossRefGoogle Scholar
11 Bendavid, A., Martin, P. J., Netterfield, R. P., and Kinder, T. J., Surface and Coatings Technology 70, 97 (1994).CrossRefGoogle Scholar
12 McKenzie, D. R., Muller, D., Pailthorpe, B. A., Wang, Z. H., Kravtchinskaya, E., Segal, D., Lukins, P. B., Swift, P. D., Martin, P. J., Amaratunga, G., Gaskell, P. H., and Saeed, A., Diamond and Related Materials 1, 51 (1991).CrossRefGoogle Scholar
13 Lossy, R., Pappas, D. L., Roy, R. A., Cuomo, J. J., and Sura, V. M., Appl. Phys. Lett. 61,171 (1992).Google Scholar
14 Aksenov, I. I., Vakula, S. I., Padalka, V. G., Strel'nitskii, V. E., and Khoroshikh, V. M., Zhurn. Tekh. Fiz. 50, 2000 (1980); Sov. Phys.-Tech. Phys. 25, 1164 (1980).Google Scholar
15 Anders, A., Anders, S., and Brown, I. G., Plasma Sources Sci. & Technol. 4, 1 (1995).CrossRefGoogle Scholar
16 Boxman, R. L. and Goldsmith, S., Surface Coatings Technol. 52, 39 (1992).CrossRefGoogle Scholar
17 Anders, A., Anders, S., Brown, I. G., Mat. Res. Soc. Symp. Proc. 316, 833 (1994).CrossRefGoogle Scholar
18 Brown, I. G., Anders, A., Anders, S., Castro, R. A., Dickinson, M. R., MacGill, R. A., and Wang, Z., presented at the Ninth international Conference on Ion Beam Modification of Materials, Canberra, Australia, 1995 (unpublished).Google Scholar
19 MacGill, R. A., Anders, S., Anders, A., Castro, R. A., Dickinson, M. R., Yu, K. M., and Brown, I. G., Surface Coatings Technol. (1995) accepted for publication.Google Scholar
20 Biersack, J. P., Berg, S., and Nender, C., Nucl. INstrum. Meth. Phys. Res. B59/60, 21 (1991).CrossRefGoogle Scholar