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γ-Al2O3 Thin Films Catalyst Model Support Preparation on β-NiAl(110) Alloy

Published online by Cambridge University Press:  31 January 2011

Zhongfan Zhang ,
Long Li ,
Malay Shah ,
Jianguo Wen  and
Judith C Yang
Zhongfan Zhang
Affiliation:
zhz33@pitt.edu, University of Pittsburgh, Mechanical Engineering and Materials Science, Pittsburgh, Pennsylvania, United States
Long Li
Affiliation:
lil2@pitt.edu, University of Pittsburgh, Mechanical Engineering and Materials Science, Pittsburgh, Pennsylvania, United States
Malay Shah
Affiliation:
mds47@pitt.edu, University of Pittsburgh, Mechanical Engineering and Materials Science, Pittsburgh, Pennsylvania, United States
Jianguo Wen
Affiliation:
wen@mrl.uiuc.edu, University of Illinois at Urbana-Champaign, Frederick Seitz Materials Research Laboratory, Urbana, Illinois, United States
Judith C Yang
Affiliation:
judyyang@pitt.edu, University of Pittsburgh, Mechanical Engineering and Materials Science, Pittsburgh, Pennsylvania, United States
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Abstract

Low temperature oxidation of NiAl(110) alloy has been studied with surface characterization methods and cross-section TEM. Our work demonstrated thin and high quality single crystal γ-Al2O3(111) films have grown heteroepitaxially on NiAl(110) alloy. The orientation relationship of metal/oxide is NiAl(110) || γ-A12O3(111)and NiAl(211)∥γ-Al2O3(311) with very slight lattice mismatch. Al cation outward diffusion dominates during this low temperature oxidation confirmed by EELS mapping along interface.

Keywords

thin filmoxidationcrystal growth
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1217: Symposium Y – Catalytic Materials for Energy, Green Processes and Nanotechnology , 2009 , 1217-Y05-02
Copyright
Copyright © Materials Research Society 2010

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