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Antireflective MgF2 Coating on Polycarbonate

Published online by Cambridge University Press:  01 February 2011

Takanobu Hori ,
Isao Tokomoto ,
Kazuo Uetani ,
Masashi Fukinbara ,
Akira Kato  and
Hiroshi Kajiyama
Takanobu Hori
Affiliation:
R&D Center, ShinMaywa Industries, Ltd., Hyogo 663-8001, Japan.
Isao Tokomoto
Affiliation:
R&D Center, ShinMaywa Industries, Ltd., Hyogo 663-8001, Japan.
Kazuo Uetani
Affiliation:
R&D Center, ShinMaywa Industries, Ltd., Hyogo 663-8001, Japan.
Masashi Fukinbara
Affiliation:
Graduate School of Engineering, Ibaraki University, Ibaraki 316-8511, Japan.
Akira Kato
Affiliation:
Hitachi Research Laboratory, Hitachi, Ltd., Ibaraki 319-1292, Japan.
Hiroshi Kajiyama
Affiliation:
Graduate School of Engineering, Ibaraki University, Ibaraki 316-8511, Japan. Hitachi Research Laboratory, Hitachi, Ltd., Ibaraki 319-1292, Japan.
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Abstract

We deposited MgF2 thin films using the ion-plating method that features RF and DC biasing to the substrate holder. We investigated the effects of RF powers, substrate temperatures (Ts) and DC bias voltages on optical absorption and abrasion resistance of the films. The optical absorption deteriorated by increasing RF power and Ts. In particular, the deterioration was quite serious when the Ts were above 423 K. The abrasion resistance increased by increasing the Ts. We found that the abrasion resistance could be improved also by increasing a DC bias voltage. The same abrasion resistance as the film deposited by a conventional heat resistance deposition at 573 K was obtained by applying the DC bias voltage of -500 V and the Ts of 300 K.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 722: Symposia K/L – Materials and Devices for Optoelectronics and Photonics – Photonic Crystals-From Materials to Devices , 2002 , L5.3
Copyright
Copyright © Materials Research Society 2002

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