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Atomic Layer Deposition on Quantities of Multiwalled Carbon Nanotubes

Published online by Cambridge University Press:  01 February 2011

Andrew S. Cavanagh
Affiliation:
andrew.cavanagh@colorado.edu, University of Colorado, Dept. of Physics, Boulder, CO, 80309, United States
Christopher A. Wilson
Affiliation:
Christopher.A.Wilson@Colorado.EDU, University of Colorado, Dept. of Chemistry and Biochemistry, Boulder, CO, 80309, United States
Alan W. Weimer
Affiliation:
Alan.Weimer@Colorado.EDU, University of Colorado, Dept. of Chemical and Biological Engineering, Boulder, CO, 80309, United States
Steven M. George
Affiliation:
Steven.George@Colorado.edu, University of Colorado, Dept. of Chemistry and Biochemistry, Boulder, CO, 80309, United States
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Abstract

Atomic layer deposition (ALD) was performed on quantities of multiwalled carbon nanotubes (MWCNTs) in a rotary reactor. Because of nucleation difficulties, Al2O3 ALD grew as nanospheres on the MWCNTs. After a NO2 nucleation treatment, Al2O3 ALD films grew conformally and noncovalently functionalized the surface of the MWCNT. This Al2O3 ALD film served as a platform for the growth of W ALD metal. The uncoated and ALD-coated MWCNTs were characterized with transmission electron microscopy and x-ray photoelectron spectroscopy. This study demonstrates that ALD can be performed on quantities of very high surface area MWCNT substrates.

Type
Research Article
Copyright
Copyright © Materials Research Society 2008

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