Hostname: page-component-8448b6f56d-t5pn6 Total loading time: 0 Render date: 2024-04-24T23:20:24.911Z Has data issue: false hasContentIssue false

The Channeling of Ions Near the Silicon 〈001〉 Axis

Published online by Cambridge University Press:  25 February 2011

J. F. Ziegler
Affiliation:
IBM Research, Yorktown Heights, NY 10598
R. F. Lever
Affiliation:
IBM-GPD Division, Hopewell Junction, NY 12533
Get access

Abstract

The first experimental mapping of the ion beam channels near the Si 〈001〉 axis is reported. Remarkably fine structure is observed, with over thirty microchannels identified within 20 degrees of the Si 〈001〉 axis. Each map is made from about 16000 channeling spectra with each channeling probability becoming a pixel of information in the final plot. Contour maps have been constructed for ions of He and N with energies from 50 to 2000 keV. All features are identified by theoretical plots of silicon planar channels and axial channels.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Footnotes

Paper presented in symposium but not published.

References

Paper presented in symposium but not published.