Hostname: page-component-8448b6f56d-jr42d Total loading time: 0 Render date: 2024-04-25T03:43:18.306Z Has data issue: false hasContentIssue false
  • English
  • Français

Characterization of Epitaxial Films by Grazing-Incidence X-Ray Diffraction

Published online by Cambridge University Press:  26 February 2011

Armin Segmüller
Armin Segmüller*
Affiliation:
IBM Thomas J. Watson Research Center, P. O. Box 218, Yorktown Heights, N. Y. 10598, USA
Get access

Abstract

Grazing-incidence x-ray diffraction, a surface-sensitive technique, has been used to obtain structural details parallel to the interface of an epitaxial system, such as lattice parameters, strain, crystallite size and orientation, on films with thicknesses ranging down to a few mono-atomic layers. Tungsten grows epitaxially on the (1102) plane of sapphire, with the orientation W (001) ∥ Al2O3 (1102) and W [110] ∥ Al2O, [1120]. Sufficient diffraction intensity for characterization could be obtained from ∼30A-thick W films. Layers of GaAs can be grown epitaxially on the basal plane of sapphire with the orientation GaAs(111) ∥ Al2O3(00.1) and GaAs [110] ∥ Al2O3[1120]. Niobium films grow on GaAs (001) and (111) substrates with a (001) plane parallel to the interface, whereas molybdenum films prefer to grow with a (111) plane on both substrates. The best orientation, i. e. the smallest mosaic spread, of the film is obtained when the substrate plane has the same symmetry as the preferred film growth plane. In all these cases with relatively large misfit, the strain observed parallel to the interface is only a small fraction of the theoretical misfit strain, indicating the relief of the misfit strain within the first few atomic layers.

Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 77: Symposium D – Interfaces, Superlattices, and Thin Films , 1986 , 151
Copyright
Copyright © Materials Research Society 1987

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Segmüller, A. and Murakami, M., in Thin Films from Free Atoms and Particles, edited by Klabunde, K. J. (Academic Press, New York, 1985), pp. 325–351.CrossRefGoogle Scholar
2. Marra, W. C., Eisenberger, P., and Cho, A. Y., J. Appl. Phys. 50, 6927 (1979).CrossRefGoogle Scholar
3. Segmüller, A., Adv. X-Ray Anal. 29, 353 (1986).Google Scholar
4. Schulz, L. G., J. Appl. Phys. 20, 1030 (1949).CrossRefGoogle Scholar
5. Souk, J. H., Ohanlon, J. F., and Angilello, J., J. Vac. Sci. Technol. A 3, 2289 (1985).CrossRefGoogle Scholar
6. Souk, J. H., Segmüller, A., and Angilello, J., to be published.Google Scholar
7. Kuech, T. F., unpublished.Google Scholar
8. Bloch, J., Heiblum, M., and Komem, Y., Appl. Phys. Lett. 46, 1092 (1985).CrossRefGoogle Scholar
9. Eizenberg, M., Smith, D. A., Heiblum, M., and Segmüller, A., Appl. Phys. Lett. 49, 422 (1986).CrossRefGoogle Scholar
10. Eizenberg, M., Segmüller, A., Heiblum, M., and Smith, D. A., to be published.Google Scholar