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Characterization of Films Made from Silicon Oil Saturated Methane Vapor by Ion Beam

Published online by Cambridge University Press:  25 February 2011

Sin-Shong Lin
Affiliation:
Anny Research Laboratory - Materials Directorate, Watertown, MA 02172–0001
Janes M. Sloan
Affiliation:
Anny Research Laboratory - Materials Directorate, Watertown, MA 02172–0001
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Abstract

Amorphous carbon films were prepared by the ion beam deposition of methane saturated with silicon pump oil 704. The concentration of Si in the ion deposited coatings could be varied by the temperature of silicon oil bath where saturated vapor was produced. In the process, the vapor ionized at 800 V was accelerated and impinged on glass or stainless steel substrates at ion densities between 0.3–1.5 mA/cm2 for a period of less than 60 minutes. The resulting films were characterized by x-ray photoelectron and Raman spectroscopies. The elemental components of these films include carbon, oxygen and silicon with varying amounts of nitrogen, iron and tungsten contaminations. The microstructure mainly consists of tiny graphitic carbon with sp2 ordered and disordered configurations, numerous carbon-oxygen and carbon-silicon linkages. This simple unique process yields a homogeneous thin coating suitable for many tribological applications.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

REFERENCES

1. Hioki, T., Itoh, Y., Itoh, A., Hibi, S. & Kawamoto, J., 8th International Conference on Thin Films, San Diego, April 2–6, 1990 Google Scholar
2. Weissmantel, C., Thin Solid Films, 35, 255 (1976)Google Scholar
3. Braun, M., Khosroupour, H., Johnson, E. & Hogmark, H., Nucl. Inst. Meth. Phys. Res. B, 37/38, 434 (1989)Google Scholar
4. Dessimoni, E., Casella, G. I., Cataldi, T. R. I. & Malitesta, C., J. Electro. Spectrosc. Relat. Phenom., 49, 247 (1989)Google Scholar
5. Briggs, D. & Seah, M. P., Practical Surface Analyses, (Join Wiley & Sons, NY, 1985)Google Scholar
6. Angus, J. C. & Jansen, F., J. Vac. Sci. Technol. A6, 1778 (1988)CrossRefGoogle Scholar
7. Angus, J. C. & Haymen, C. C., Science 241, 913 (1988)Google Scholar
8. Nemanich, R. J., Glass, J. T., Lucovsky, G. and Shroder, R., J. Vac. Sci. Technol. A6, 1783 (1988)Google Scholar