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Detailed Model of the Afterglow Region of a Microwave Generated Oxygen Plasma

Published online by Cambridge University Press:  25 February 2011

Chin-Hao Chou ,
Ta-Chin Wei  and
Jonathan Phillips
Chin-Hao Chou
Affiliation:
The Pennsylvania State University, Department of Chemical Engineering, and Center for Electronic Materials and Processing, 133 Fenske Laboratory, University Park, PA. 16802
Ta-Chin Wei
Affiliation:
The Pennsylvania State University, Department of Chemical Engineering, and Center for Electronic Materials and Processing, 133 Fenske Laboratory, University Park, PA. 16802
Jonathan Phillips*
Affiliation:
The Pennsylvania State University, Department of Chemical Engineering, and Center for Electronic Materials and Processing, 133 Fenske Laboratory, University Park, PA. 16802
*
*To whom correspondence should be addressed
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Abstract

A one dimensional mass continuity equation was used to model a low pressure, high radical concentration, non-isothermal oxygen afterglow reactor. The mathematics are very similar to those used to model flames. It was shown that the model, with no adjustable parameters, yielded very good agreement with experimental measures of O-atom flux. The model was manipulated to study the influence of temperature profile, pressure, homogeneous and heterogeneous kinetics, O-atom generation and flow rate on the afterglow plasma.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 268: Symposium K – Materials Modification by Energetic Atoms and Ions , 1992 , 49
Copyright
Copyright © Materials Research Society 1992

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References

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