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Electric Field Assisted DNA Surface Reactions on the Sub-ms Timescale

Published online by Cambridge University Press:  01 February 2011

Ricardo Cabeca ,
D. M.F. Prazeres ,
V. Chu  and
J. P. Conde
Ricardo Cabeca
Affiliation:
rcabeca@inesc-mn.pt, INESC-MN, INESC-MN, Rua Alves Redol, 9, Lisbon, 1000-029, Portugal
D. M.F. Prazeres
Affiliation:
pcprazer@alfa.ist.utl.pt, IST, IBB, Av. Rovisco Pais, Lisbon, 1049-001, Portugal
V. Chu
Affiliation:
vchu@inesc-mn.pt, INESC-MN, Rua Alves Redol, 9, Lisbon, 1000-029, Portugal
J. P. Conde
Affiliation:
joao.conde@ist.utl.pt, INESC-MN, Rua Alves Redol, 9, Lisbon, 1000-029, Portugal
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Abstract

The on-chip application of single, sub-ms voltage pulses promotes the immobilization of single stranded DNA (ssDNA) probes from a solution to a chemically functionalized SiO2 surface and as well as the hybridization between ssDNA targets from a solution to covalently immobilized ssDNA probes (E-assisted DNA reactions). Compared to diffusion-based surface reactions (in the absence of the applied electric field), an improvement of several orders of magnitude in the kinetics of the immobilization and hybridization reactions is observed with low amplitude (below 2 V) and short duration (100 ns to 1 ms) voltage pulses. E-assisted DNA reactions are demonstrated using mm-size macroelectrodes and then optimized using μm-size microelectrodes.

Keywords

surface chemistrysurface reactionbiological
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1092: Symposium BB – Signal Transduction Across the Biology-Technology Interface , 2008 , 1092-BB01-05
Copyright
Copyright © Materials Research Society 2008

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