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Excimer Laser Crystallisation of Poly-Si TFTs for AMLCDs

Published online by Cambridge University Press:  14 March 2011

S D Brotherton ,
D J McCulloch ,
J P Gowers ,
J R Ayres ,
C A Fisher  and
F W Rohlfing
S D Brotherton
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
D J McCulloch
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
J P Gowers
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
J R Ayres
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
C A Fisher
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
F W Rohlfing
Affiliation:
Philips Research Laboratories, Cross Oak Lane, Redhill, Surrey, RH1 5HA, England
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Abstract

There is interest in reducing the shot number in the poly-Si laser crystallisation process in order to improve its throughput. Two distinct shot number dependent effects have been identified, which are both laser intensity dependent. The critical laser energy density is that which causes full film melt-through, and the major issue occurs at energies greater than this, where there is a considerable degradation in device uniformity with reducing shot number. The cause of this is non-uniform recovery of the full-melt-through fine grain poly-Si, and it is demonstrated that by extending the trailing edge of the beam, the material uniformity at reduced shot number can be improved. For energies less than this, the issue is not so much uniformity, as a general degradation in overall device properties with reducing shot number, which has been correlated with reducing grain size.

In more demanding, future applications (such as system-on-panel), it will be necessary to improve circuit performance and approach that of current MOSFET devices. This will require short channel, self-aligned (SA) TFTs, and some of the issues with this architecture, particularly lateral ion implantation damage beneath the gate edge and drain field relief are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 621: Symposia Q/R – Electron-Emissive Materials, Vacuum Microelectronics… , 2000 , Q7.1.1
Copyright
Copyright © Materials Research Society 2000

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References

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