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The Growth and Characterization of Zinc Oxide Thin Film on Fused Silica and SiO2/Si(100) Substrates

  • C. Jin (a1), A. Tiwari (a1), H. Porter (a1), M. Park (a1) and J. Narayan (a1)...
Abstratct
ABSTRATCT

In this work, ZnO thin films were grown on amorphous fused silica and pre-oxidized silicon substrates by using pulsed laser deposition technique. X-ray diffraction patterns showed that the films were highly crystalline and c-axis oriented. The surface morphologies of the films were observed by using scanning electron microscope and optical microscope. Free exciton absorption was observed at room temperature for the film grown on fused silica substrate. The strong near-UV luminescence peaked at 380 nm were observed for all the films and was attributed to the phonon-related exciton emission. The effect of oxygen partial pressure on the luminescence intensity is also reported.

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MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
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