Hostname: page-component-8448b6f56d-dnltx Total loading time: 0 Render date: 2024-04-19T04:15:55.438Z Has data issue: false hasContentIssue false

Growth of Ge1xCx, Alloys on Si by Combined Low-Energy Ion Beam and Molecular Beam Epitaxy Method

Published online by Cambridge University Press:  15 February 2011

H. Shibata
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
S. Kimura
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
P. Fons
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
A. Yamada
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
Y. Makita
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
A. Obara
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
N. Kobayashi
Affiliation:
Electrotechnical Laboratory, 1-1–4 Umezono, Tsukuba, Ibaraki 305, Japan.
H. Takahashi
Affiliation:
Nippon Institute of Technology, 4-4-1, Gakuendai, Miyashirocho, Minamisaitama-gun, Saitama 345, Japan.
H. Katsumata
Affiliation:
Meiji University, 1-1-1 Higashi-Mita, Tama, Kawasaki, Kanagawa 214, Japan.
J. Tanabe
Affiliation:
Nippon Institute of Technology, 4-4-1, Gakuendai, Miyashirocho, Minamisaitama-gun, Saitama 345, Japan.
S. Uekusa
Affiliation:
Meiji University, 1-1-1 Higashi-Mita, Tama, Kawasaki, Kanagawa 214, Japan.
Get access

Abstract

A combined ion beam and molecular beam epitaxy (CIBMBE) method was applied for the deposition of a Ge1x, Cx, alloy on Si(100) using a low-energy ( 50 – 100 eV ) C+ ion beam and a Ge molecular beam. Metastable Ge1xCx solid solutions were formed up to x= 0.047, and the CIBMBE method was shown to have a very high potential to grow metastable Ge1xCx alloys. It was also revealed that the sticking coefficient of C+ ions into Ge was ˜28% for Ei = 100 eV and ˜18% for Ei. = 50 eV. Structural characterization suggests that the deposited films are single crystals grown epitaxially on the substrate with twins on {111} planes. Characterization of lattice dynamics using Raman spectroscopy suggested that the deposited layers have a small amount of ion irradiation damage.

Type
Research Article
Copyright
Copyright © Materials Research Society 1997

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Osten, H.J., Bugiel, E., and Zaumsel, P., J Cryst. Growth 1 4 2, 322 (1994).Google Scholar
2. Osten, H. J. and Klatt, J., Appl. Phys. Lett. 6 5, 630 (1994).Google Scholar
3. Kolodzey, J., O'Neil, P. A., Zhang, S., Orner, B. A., Roe, K., Unruh, K. M., Swann, C. P., and Waite, M. M., Appl. Phys. Lett. 6 7, 1865 (1995).Google Scholar
4. Orner, B. A., Khan, A., Hits, D., Chen, F., Roe, K., Pickett, J., Shao, X., Wilson, R. G., Berger, P. R., and Kolodzey, J., J. Electronic Materials 2 5, 297 (1995).Google Scholar
5. Iida, T., Makita, Y., Kimura, S., Winter, S., Yamada, A., Shibata, H., Obara, A., Niki, S., Fons, P., and Tsai, Y., Appl. Phys. Lett 6 3, '1951 (1993).Google Scholar
6. Shibata, H., Makita, Y., Katsumata, H., Kimura, S., Kobayashi, N., Hasegawa, M., Hishita, S., Beye, A. C., Takahashi, H., Tanabe, J., and Uekusa, S., Mater. Res. Soc. Proc. 4 0 2, 517 (1996).Google Scholar
7. Moulder, J. F., Stickle, W. F., Sobol, P. E., and Bombem, K. D., in Handbook of X-ray Photoelectron Spectroscopy, edited by Chastain, J. ( Perkin-Elmer Corporation, 1992).Google Scholar
8. Richter, H., Wang, Z. P., and Ley, L., Solid State Commun. 3 9, 625 (1981).Google Scholar
9. Tiong, K.K., Amirtharal, P. M., Pollak, F. H., and Aspnes, D. E., Appl. Phys. Lett. 4 4, 122 (1984).Google Scholar