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The Initial Stages of Silicide Epitaxy - Nucleation and Morphology

Published online by Cambridge University Press:  25 February 2011

R. J. Nemanich ,
C. M. Doland  and
F. A. Ponce
R. J. Nemanich
Affiliation:
North Carolina State University, Departments of Physics and Materials Science and Engineering, Raleigh, NC 27695–8202
C. M. Doland
Affiliation:
Xerox PARC, 3333 Coyote Hill Road, Palo Alto, CA 94304
F. A. Ponce
Affiliation:
Xerox PARC, 3333 Coyote Hill Road, Palo Alto, CA 94304
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Abstract

The initial stages of epitaxial silicide formation are described in terms of the nucleation properties. The reaction process is divided into the stages of interdiffusion, nucleation, and growth and coalescence. The aspects of the nucleation from the interdiffused regions are described. Results are presented for Pd and Pt deposited on clean Si surfaces. The initial thickness where silicide compound formation is observed is related to he critical cluster size of the nucleation model. The epitaxial morphology can be strongly influenced by heterogeneous nucleation involving the substrate interface, and this effect is demonstrated by reaction with metal overlayers less than the critical thickness.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 94: Symposium D – Initial Stages of Epitaxial Growth , 1987 , 139
Copyright
Copyright © Materials Research Society 1987

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References

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