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Large-Area Hydrogenated Amorphous and Microcrystalline Silicon Double-Junction Solar Cells

Published online by Cambridge University Press:  21 March 2011

Baojie Yan
Affiliation:
United Solar Ovonic Corporation, 1100 West Maple Road, Troy, Michigan 48084
Guozhen Yue
Affiliation:
United Solar Ovonic Corporation, 1100 West Maple Road, Troy, Michigan 48084
Arindam Banerjee
Affiliation:
United Solar Ovonic Corporation, 1100 West Maple Road, Troy, Michigan 48084
Jeffrey Yang
Affiliation:
United Solar Ovonic Corporation, 1100 West Maple Road, Troy, Michigan 48084
Subhendu Guha
Affiliation:
United Solar Ovonic Corporation, 1100 West Maple Road, Troy, Michigan 48084
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Abstract

Hydrogenated amorphous silicon (a-Si:H) and hydrogenated microcrystalline silicon ( c-Si:H) double-junction solar cells were deposited on a large-area substrate using a RF glow discharge technique at various rates. The thickness uniformity for both a-Si:H and c-Si:H is well within ± 10% and the reproducibility is very good. Preliminary results from the large-area a-Si:H/m c-Si:H double-junction structures show an initial aperture-area efficiency of 11.8% and 11.3%, respectively, for 45 cm2 and 461 cm2 size un-encapsulated solar cells. The 11.3% cell became 10.6% after encapsulation and stabilized at 9.5% after prolonged light soaking under 100 mW/cm2 of white light at 50°C. High rate deposition of the c-Si:H layer in the bottom cell was made using the high-pressure approach. An initial active-area (0.25 cm2) efficiency of 11.3% was achieved using an a-Si:H/m c-Si:H double-junction structure with 50 minutes of c-Si:H deposition time.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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