Skip to main content

Localized Charging Effects Resulting From Focused Ion Beam Processing Of Non-Conductive Materials

  • Marion. A. Stevens-Kalceff (a1), S. Rubanov (a1) and P. R. Munroe (a2)

Focused Ion Beam (FIB) systems employ a finely focussed beam of positively charged ions to process materials. Ion induced charging effects in non-conductive materials have been confirmed using Scanning Surface Potential Microscopy (SSPM). Significant localized residual charging is observed within the ion implanted micro-volumes of non-conductive materials both prior to and following the onset of sputtering. Characteristic observed surface potentials associated with the resultant charging have been modelled, giving insight into the charging processes during implantation and sputtering. The results of this work have implications for the processing and microanalysis of non-conductive materials in FIB systems.

Hide All
1. Cazaux, J., J. Appl. Phys 59, 1418 (1986)
2. Stevens-Kalceff, M.A. 7 Appl. Phys. Lett. 9, 3050 (2001).
3. Stevens-Kalceff, M.A. Microscopy & Microanalysis (accepted for publication, 2003)
4. Bonnell, D.A. Scanning Probe Microscopy and Spectroscopy: Theory, Techniques and Applications. (Wiley-VCH, New York, 2001)
5. Reyntjens, S & Puers, R Journal of Micromechanics & Microengineering, 11(4), 287 (2001)
6. ISP Optics, Irvington NY, USA
7. Ziegler, J F 2000 Stopping and Range of Ions in Matter (SRIM 2000),
8. Lefebvre, F, Vigouroux, J P and Perreau, J Journal of Applied Physics, 65(4), 1683 (1989)
9. Veeco/Digital Instruments, Santa Barbara, CA, USA
10. Kalinin, S.V. & Bonnell, D.A., chapter 7 in reference 2 (2001)
11. Programs HiPhi and MetaMesh, Field Precision, Albuquerque, NM, USA
Recommend this journal

Email your librarian or administrator to recommend adding this journal to your organisation's collection.

MRS Online Proceedings Library (OPL)
  • ISSN: -
  • EISSN: 1946-4274
  • URL: /core/journals/mrs-online-proceedings-library-archive
Please enter your name
Please enter a valid email address
Who would you like to send this to? *