Hostname: page-component-76fb5796d-5g6vh Total loading time: 0 Render date: 2024-04-25T07:58:41.347Z Has data issue: false hasContentIssue false

Metalorganic Molecular Beam Epitaxy of Magnesium Oxide on Silicon

Published online by Cambridge University Press:  10 February 2011

F. Niu
Affiliation:
Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, Illinois 60208
B.H. Hoerman
Affiliation:
Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, Illinois 60208
B.W. Wessels
Affiliation:
Department of Materials Science and Engineering and Materials Research Center, Northwestern University, Evanston, Illinois 60208
Get access

Abstract

Epitaxial cubic MgO thin films were deposited on single crystal Si (001) substrates by metalorganic molecular beam epitaxy (MOMBE) using the solid precursor magnesium acetylacetonate as the source and an RF excited oxygen plasma as the oxidant. The growth process involved initial formation of an epitaxial β-SiC interlayer followed by direct deposition of a MgO overlayer. The film structure was characterized by X-ray diffraction as well as conventional and high-resolution transmission electron microscopy. Both the MgO overlayer and β-SiC interlayer had an epitaxial relationship such that MgO (001) (or SiC (001)) // Si (001) and MgO [110] (or SiC [110])// Si [110]. No evidence of an amorphous layer was observed at either the MgO/SiC or SiC/Si interface. Dielectric properties of the epitaxial MgO thin films on Si (001) were evaluated from capacitance-voltage (C-V) characteristic of metal-oxide-semiconductor (MOS) structures. The C-V measurements indicated an interface trap density at midgap as low as 1011 to 1012 cm−2 eV−1 and fixed oxide charge of the order of 1011/ cm2, respectively. These results indicate that epitaxial MgO deposited by MOMBE has potential as a gate insulator.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Hubbard, K.J. and Schlom, D.G., J. Mater. Res. 11, p. 2757 (1996).Google Scholar
2 Senzaki, J., Kurihara, K., Nomura, N. and Mitsnaga, O., Jap.J.Appl.Phys. 37, p.5150 (1998).Google Scholar
3 Fork, D.K., Ponce, F.A., Tramontana, J.C. and Geballe, T.H., Appl. Phys. Lett. 58, p.2294 (1991).Google Scholar
4 Kim, S. and Hishita, S., Thin Solid Films 281–282, p. 449 (1996).Google Scholar
5 Niu, F., Hoerman, B.H. and Wessels, B.W., Appl.SurfSci., (2000)(in press).Google Scholar
6 Niu, F., Hoerman, B.H. and Wessels, B.W., Mater. Res. Soc. Symp. Proc. 606 (1999). (in press)Google Scholar
7 Nicollian, E.H., MOS Physics and Technology, John and Wiley & Son, New York, 1982, pp.906.Google Scholar
8 McKee, R.A., Walker, F.J. and Chisholm, M.F., Phys. Rev. Lett. 81, p. 3014 (1998).Google Scholar
9 Sze, S. M., Physics of Semiconductor Devices, 2nd Edition, John Wiley & Sons, New York, 1981, pp.362407.Google Scholar
10 Ferro, G., Monteil, Y., Vincent, H. and Thevehot, V., J. Appl. Phys. 80, p.4691 (1996).Google Scholar
11 Walker, F.J., McKee, R.A., Pennycook, S.J. and Thundat, T.G., Mater. Res. Soc. Symp. Proc. 401, p.13 (1996).Google Scholar