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Microcrystalline Silicon Films Produced by RF Magnetron Sputtering and the Effect of Diffrent Ambients on their Conductivity

Published online by Cambridge University Press:  21 February 2011

Ratnabali Berjee ,
A. K. Bandyopadhyay ,
S. N. Sharma ,
A. K. Patabyal  and
A.K. Barua
Ratnabali Berjee
Affiliation:
Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta : 700 032, India
A. K. Bandyopadhyay
Affiliation:
Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta : 700 032, India
S. N. Sharma
Affiliation:
Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta : 700 032, India
A. K. Patabyal
Affiliation:
Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta : 700 032, India
A.K. Barua
Affiliation:
Energy Research Unit, Indian Association for the Cultivation of Science, Calcutta : 700 032, India
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Abstract

Results on characterisation of undoped, μc-Si:H films prepared by rf magnetron sputtering technique are presented. Highly conducting films (10−3 Δ−cm−1) were obtained at fairly low rf power density (l.2W/cm2). Critical parameters for obtaining microcrystalline phase were identified. The effect of humid ambient on film properties was looked into.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 164: Symposium H – Materials Issues in Microcrystalline Semiconductors , 1989 , 69
Copyright
Copyright © Materials Research Society 1990

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