We performed plasma impedance measurements at room temperature for a hydrogen plasma using an impedance analyser. The plasma excitation frequency range spans from 40 to 70 MHz. Both the real and imaginary part of the impedance decrease monotonously with increasing frequency. These measurements are in agreement with prior experimental observations , that the required peak-to-peak voltage between the electrodes is reduced at higher excitation frequencies. Using a simple equivalent circuit for the plasma this effect can be mainly attributed to the increased sheath capacitance. Furthermore, by modelling the sheath with a simple parallel plate capacitor, its thickness could be estimated: it decreases from 2 MM at 40 MHz to about 1.4 MM at 70 MHz plasma excitation frequency. Finally, a possible link between the decreasing sheath thickness on the increase of deposition rate is discussed.