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Nano-Graphitization in Amorphous Carbon Films via Electron Beam Irradiation and the Iron Implantation

Published online by Cambridge University Press:  01 February 2011

Tatsuhiko Aizawa
Affiliation:
iwamura@arakawachem.co.jp, R & D Center, Arakawa Chemical Industry, Ltd., Osaka, 538-0053, Japan
Eiji Iwamura
Affiliation:
aizawa@asiaseed.org, University of Toronto, Department of Materials Sciece and Engineering, College Street 105, Toronto, M5S 3E4, Canada
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Abstract

Nano-graphitization from amorphous carbon state is assisted by the electron beam irradiation. An inter-columnar region in the amorphous carbon films with low atomic and electron densities is controlled to have a graphitic structure with relatively low dose electron beam irradiation. This amorphous carbon ? beam interaction generates a new type of carbon hybrids where amorphous carbon phase columns are sustained by the graphitic inter-columnar network. This hybrid film has an exotic mechanical and tribologic response: extraordinary reversible deformability up to 8 – 10 % normal strain, high wearing resistance and low friction at high normal pressure. A combination of iron implantation with this electron irradiation provides us the other nano-graphitization process. An amorphous carbon film including the implanted iron atoms is chemically modified to have a columnar graphitic structure by the electron beam irradiation. In this post-implantation electron beam irradiation, the basic graphitic units with 1-2 nm in size are controlled to align vertically along the film thickness. This type of nano-graphitization has a strong dependency on the iron doses before electron beam irradiation. The above two types of nano-graphitization provides us a new tool to explore the functionalized structural thin films in application.

Type
Research Article
Copyright
Copyright © Materials Research Society 2007

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