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A New Force-Displacement Model for Continuous Indentation of Bilayer Materials

Published online by Cambridge University Press:  21 March 2011

A. Nayebi ,
R. El Abdi ,
G. Mauvoisin  and
O. Bartier
A. Nayebi
Affiliation:
University of Rennes Applied Mechanics Research Laboratory I.U.T. de Rennes. 3, rue du Clos Courtel - B.P. 90422-35704 Rennes Cedex 7, France
R. El Abdi
Affiliation:
University of Rennes Applied Mechanics Research Laboratory I.U.T. de Rennes. 3, rue du Clos Courtel - B.P. 90422-35704 Rennes Cedex 7, France
G. Mauvoisin
Affiliation:
University of Rennes Applied Mechanics Research Laboratory I.U.T. de Rennes. 3, rue du Clos Courtel - B.P. 90422-35704 Rennes Cedex 7, France
O. Bartier
Affiliation:
University of Rennes Applied Mechanics Research Laboratory I.U.T. de Rennes. 3, rue du Clos Courtel - B.P. 90422-35704 Rennes Cedex 7, France
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Abstract

A new relationship between indentation load and depth in relation to flow stress and strain hardening exponents of film and substrate of bilayers is given. The comparison between the numerical results and those experimentally obtained from known materials, confirms the interest of the proposed model for film characterization of these materials.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 695: Symposium L – Thin Films: Stresses and Mechanical Properties IX , 2001 , L6.5.1
Copyright
Copyright © Materials Research Society 2002

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References

REFERENCES

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