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Optical Interconnect Components for Wafer Level Heterogeneous Hyper-Integration

Published online by Cambridge University Press:  17 March 2011

P. D. Persans
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
M. Ojha
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
R. J. Gutmann
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
J.-Q. Lu
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
A. Filin
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
J. Plawsky
Affiliation:
Focus Research Center: Interconnections for Gigascale Integration Rensselaer Polytechnic Institute, Troy, New York 12180, U.S.A
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Abstract

Optical waveguides for three-dimensionally stacked chip fabrication technologies, in which optical connection between layers plays a central role, are described. CMOS-compatible approaches to optical via and waveguide fabrication are addressed. Detailed modeling is used for design optimization and also addresses how manufacturing variations from ideal design may affect device performance.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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