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Phenyl Silica Glass for Formation of Porous Dielectric Film
Published online by Cambridge University Press: 10 February 2011
Abstract
Phenyl and alkyl groups were introduced into silica glass in order to prevent the formation of a Si-O network and reduce its density and to reduce the dielectric constant of the glass. In this regard, the phenyl group was more effective than the alkyl group. The measured Si-O intensity of FTIR spectrum of the glass with introduced phenyl was only 14% of thermal SiO2 film, however, the thermally stable carbon component prevented further reduction in density after 400°C annealing.
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- Copyright © Materials Research Society 1999
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